Thin Films Atomic Layer Deposition And 3d Printing
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Author |
: KINGSLEY. UKOBA |
Publisher |
: |
Total Pages |
: 0 |
Release |
: 2023-11-10 |
ISBN-10 |
: 1032416955 |
ISBN-13 |
: 9781032416953 |
Rating |
: 4/5 (55 Downloads) |
Synopsis Thin Films, Atomic Layer Deposition, and 3D Printing by : KINGSLEY. UKOBA
It explains concept of thin films, atomic layers deposition, and the fourth industrial revolution (4IR) with aim to illustrate existing resources and explains processes, provide a selection of different types of 3D printing, used materials, emerging trends and applications, and current top-performing 3D printers using different technologies.
Author |
: Kingsley Ukoba |
Publisher |
: CRC Press |
Total Pages |
: 287 |
Release |
: 2023-11-29 |
ISBN-10 |
: 9781000999198 |
ISBN-13 |
: 100099919X |
Rating |
: 4/5 (98 Downloads) |
Synopsis Thin Films, Atomic Layer Deposition, and 3D Printing by : Kingsley Ukoba
Thin Films, Atomic Layer Deposition, and 3D Printing explains the concept of thin films, atomic layers deposition, and the Fourth Industrial Revolution (4IR) with an aim to illustrate existing resources and give a broader perspective of the involved processes as well as provide a selection of different types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavors for both experts/nonexperts. The book includes figures, diagrams, and their applications in real-life situations. Features: Provides comprehensive material on conventional and emerging thin film, atomic layer, and additive technologies. Discusses the concept of Industry 4.0 in thin films technology. Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications. Explores detailed bibliometric analyses on pertinent applications. Interconnects atomic layer deposition and additive manufacturing. This book is aimed at researchers and graduate students in mechanical, materials, and metallurgical engineering.
Author |
: Fredrick Madaraka Mwema |
Publisher |
: CRC Press |
Total Pages |
: 309 |
Release |
: 2022-06-19 |
ISBN-10 |
: 9781000597318 |
ISBN-13 |
: 1000597318 |
Rating |
: 4/5 (18 Downloads) |
Synopsis Thin Film Coatings by : Fredrick Madaraka Mwema
Thin Film Coatings: Properties, Deposition, and Applications discusses the holistic subject of conventional and emerging thin film technologies without bias to a specific technology based on the existing literature. It covers properties and delves into the various methods of thin film deposition, including the most recent techniques and a direction for future developments. It also discusses the cutting-edge applications of thin film coatings such as self-healing and smart coatings, biomedical, hybrid, and scalable thin films. Finally, the concept of Industry 4.0 in thin film coating technology is examined. This book: Explores a wide range and is not specific to material and method of deposition Demonstrates the application of thin film coatings in nearly all sectors, such as energy and anti-microbial applications Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications Provides detailed bibliometric analyses on applications of thin film coatings Discusses Industry 4.0 and 3D printing in thin film technology With its broad coverage, this comprehensive reference will appeal to a wide audience of materials scientists and engineers and others studying and developing advanced thin film technologies.
Author |
: Anthony C. Jones |
Publisher |
: Royal Society of Chemistry |
Total Pages |
: 600 |
Release |
: 2009 |
ISBN-10 |
: 9780854044658 |
ISBN-13 |
: 0854044655 |
Rating |
: 4/5 (58 Downloads) |
Synopsis Chemical Vapour Deposition by : Anthony C. Jones
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Author |
: Cheol Seong Hwang |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 266 |
Release |
: 2013-10-18 |
ISBN-10 |
: 9781461480549 |
ISBN-13 |
: 146148054X |
Rating |
: 4/5 (49 Downloads) |
Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author |
: Tommi Kääriäinen |
Publisher |
: John Wiley & Sons |
Total Pages |
: 274 |
Release |
: 2013-05-28 |
ISBN-10 |
: 9781118062777 |
ISBN-13 |
: 1118062779 |
Rating |
: 4/5 (77 Downloads) |
Synopsis Atomic Layer Deposition by : Tommi Kääriäinen
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Author |
: S. de Gendt |
Publisher |
: The Electrochemical Society |
Total Pages |
: 425 |
Release |
: 2009-09 |
ISBN-10 |
: 9781566777414 |
ISBN-13 |
: 1566777410 |
Rating |
: 4/5 (14 Downloads) |
Synopsis Atomic Layer Deposition Applications 5 by : S. de Gendt
Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.
Author |
: Jeannie Valdez |
Publisher |
: |
Total Pages |
: 183 |
Release |
: 2015 |
ISBN-10 |
: 163483920X |
ISBN-13 |
: 9781634839204 |
Rating |
: 4/5 (0X Downloads) |
Synopsis Atomic Layer Deposition (ALD) by : Jeannie Valdez
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
Author |
: Michaela Lammel |
Publisher |
: |
Total Pages |
: |
Release |
: 2021 |
ISBN-10 |
: OCLC:1280667104 |
ISBN-13 |
: |
Rating |
: 4/5 (04 Downloads) |
Synopsis Advancing 3D Spintronics: Atomic Layer Deposition of Platinum and Yttrium Iron Garnet Thin Films by : Michaela Lammel
Author |
: Nicola Pinna |
Publisher |
: John Wiley & Sons |
Total Pages |
: 472 |
Release |
: 2012-09-19 |
ISBN-10 |
: 9783527639939 |
ISBN-13 |
: 3527639934 |
Rating |
: 4/5 (39 Downloads) |
Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.