Semiconductor Cleaning Technology 1989
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Author |
: Jerzy Ruzyllo |
Publisher |
: |
Total Pages |
: 399 |
Release |
: 1990 |
ISBN-10 |
: OCLC:634090250 |
ISBN-13 |
: |
Rating |
: 4/5 (50 Downloads) |
Synopsis Semiconductor cleaning technology 1989 by : Jerzy Ruzyllo
Author |
: Electrochemical Society. Dielectrics and Insulation Division |
Publisher |
: |
Total Pages |
: 399 |
Release |
: 1990 |
ISBN-10 |
: OCLC:39265821 |
ISBN-13 |
: |
Rating |
: 4/5 (21 Downloads) |
Synopsis Semiconductor Cleaning Technology, 1989 by : Electrochemical Society. Dielectrics and Insulation Division
Author |
: Richard E. Novak |
Publisher |
: |
Total Pages |
: 399 |
Release |
: 1990 |
ISBN-10 |
: OCLC:867183014 |
ISBN-13 |
: |
Rating |
: 4/5 (14 Downloads) |
Synopsis Semiconductor Cleaning Technology, 1989 by : Richard E. Novak
Author |
: |
Publisher |
: The Electrochemical Society |
Total Pages |
: 636 |
Release |
: 2000 |
ISBN-10 |
: 1566772591 |
ISBN-13 |
: 9781566772594 |
Rating |
: 4/5 (91 Downloads) |
Synopsis Cleaning Technology in Semiconductor Device Manufacturing by :
Author |
: Electrochemical Society |
Publisher |
: |
Total Pages |
: |
Release |
: 1990 |
ISBN-10 |
: OCLC:81765468 |
ISBN-13 |
: |
Rating |
: 4/5 (68 Downloads) |
Synopsis Semiconductor Cleaning Technology/1989 by : Electrochemical Society
Author |
: Karen Reinhardt |
Publisher |
: William Andrew |
Total Pages |
: 749 |
Release |
: 2008-12-10 |
ISBN-10 |
: 9780815517733 |
ISBN-13 |
: 0815517734 |
Rating |
: 4/5 (33 Downloads) |
Synopsis Handbook of Silicon Wafer Cleaning Technology by : Karen Reinhardt
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. - Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits - As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process - Editors are two of the top names in the field and are both extensively published - Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol
Author |
: Jerzy Rużyłło |
Publisher |
: The Electrochemical Society |
Total Pages |
: 452 |
Release |
: 2004 |
ISBN-10 |
: 156677411X |
ISBN-13 |
: 9781566774116 |
Rating |
: 4/5 (1X Downloads) |
Synopsis Cleaning Technology in Semiconductor Device Manufacturing VIII by : Jerzy Rużyłło
Author |
: Takeshi Hattori |
Publisher |
: The Electrochemical Society |
Total Pages |
: 497 |
Release |
: 2007 |
ISBN-10 |
: 9781566775687 |
ISBN-13 |
: 156677568X |
Rating |
: 4/5 (87 Downloads) |
Synopsis Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 by : Takeshi Hattori
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
Author |
: Vikram J. Kapoor |
Publisher |
: The Electrochemical Society |
Total Pages |
: 644 |
Release |
: 1994 |
ISBN-10 |
: 1566770483 |
ISBN-13 |
: 9781566770484 |
Rating |
: 4/5 (83 Downloads) |
Synopsis Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films by : Vikram J. Kapoor
Author |
: Jerzy Rużyłło |
Publisher |
: The Electrochemical Society |
Total Pages |
: 668 |
Release |
: 1998 |
ISBN-10 |
: 1566771889 |
ISBN-13 |
: 9781566771887 |
Rating |
: 4/5 (89 Downloads) |
Synopsis Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing by : Jerzy Rużyłło