Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition And In Situ Characterization Of Nanoscale Titanium Dioxide Films
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Author |
: Polly Wanda Chu |
Publisher |
: |
Total Pages |
: 434 |
Release |
: 1994 |
ISBN-10 |
: CORNELL:31924074527387 |
ISBN-13 |
: |
Rating |
: 4/5 (87 Downloads) |
Synopsis Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films by : Polly Wanda Chu
Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Author |
: Huyang Xie |
Publisher |
: |
Total Pages |
: 320 |
Release |
: 1995 |
ISBN-10 |
: CORNELL:31924074370853 |
ISBN-13 |
: |
Rating |
: 4/5 (53 Downloads) |
Synopsis Growth, Microstructure and Optical Properties of Epitaxial Lithium Tantalate Thin Films by Metalorganic Chemical Vapor Deposition by : Huyang Xie
Author |
: David Christopher Gilmer |
Publisher |
: |
Total Pages |
: 314 |
Release |
: 1998 |
ISBN-10 |
: MINN:31951P00539822B |
ISBN-13 |
: |
Rating |
: 4/5 (2B Downloads) |
Synopsis Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films by : David Christopher Gilmer
Author |
: Vilailuck Siriwongrungson |
Publisher |
: |
Total Pages |
: 206 |
Release |
: 2010 |
ISBN-10 |
: OCLC:639930127 |
ISBN-13 |
: |
Rating |
: 4/5 (27 Downloads) |
Synopsis Characterisation of Step Coverage by Pulsed-pressure Metalorganic Chemical Vapour Deposition by : Vilailuck Siriwongrungson
Author |
: Anuj K. Basil |
Publisher |
: |
Total Pages |
: 0 |
Release |
: 2005 |
ISBN-10 |
: OCLC:1340479340 |
ISBN-13 |
: |
Rating |
: 4/5 (40 Downloads) |
Synopsis Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X-ray Photoelectron Spectroscopy by : Anuj K. Basil
Author |
: |
Publisher |
: |
Total Pages |
: 458 |
Release |
: 1994 |
ISBN-10 |
: STANFORD:36105020027293 |
ISBN-13 |
: |
Rating |
: 4/5 (93 Downloads) |
Synopsis Dissertation Abstracts International by :
Author |
: Jeffrey E. Bisberg |
Publisher |
: |
Total Pages |
: |
Release |
: 1987 |
ISBN-10 |
: OCLC:56217279 |
ISBN-13 |
: |
Rating |
: 4/5 (79 Downloads) |
Synopsis Metal-organic chemical vapor deposition and characterization of semiconducting titanium dioxide by : Jeffrey E. Bisberg
Author |
: Weidong Li |
Publisher |
: |
Total Pages |
: 276 |
Release |
: 2004 |
ISBN-10 |
: OCLC:55637288 |
ISBN-13 |
: |
Rating |
: 4/5 (88 Downloads) |
Synopsis Metalorganic Chemical Vapor Deposition and Characterization of TiO2 Nanoparticles by : Weidong Li
Author |
: Kanchana Vydianathan |
Publisher |
: |
Total Pages |
: 450 |
Release |
: 1998 |
ISBN-10 |
: OCLC:56889047 |
ISBN-13 |
: |
Rating |
: 4/5 (47 Downloads) |
Synopsis Metalorganic Chemical Vapor Deposition of Titanium Dioxide and Strontium Titanate for Microelectronics Applications by : Kanchana Vydianathan
Author |
: Charles John Taylor |
Publisher |
: |
Total Pages |
: 314 |
Release |
: 1999 |
ISBN-10 |
: MINN:31951P00693790L |
ISBN-13 |
: |
Rating |
: 4/5 (0L Downloads) |
Synopsis An Examination of Precursor Chemistry and Its Effect on Microstructure Development in Chemical Vapor Deposition of Titanium Dioxide and Aluminum Thin Films by : Charles John Taylor