Trace Analysis of Semiconductor Materials is a guidebook concerned with procedures of ultra-trace analysis. This book discusses six distinct techniques of trace analysis. These techniques are the most common and can be applied to various problems compared to other methods. Each of the four chapters basically includes an introduction to the principles and general statements. The theoretical basis for the technique involved is then briefly discussed. Practical applications of the techniques and the different instrumentations are explained. Then, the applications to trace analysis as pertaining to semiconductor materials are discussed. Chapter 1 discusses radiochemical practice, the analysis of semiconductor materials, separation techniques, several qualitative radiochemical schemes, radiochemical purification procedures, and several earlier reported studies. Chapter 2 covers emission spectroscopy, including its potential for future applications. Discussions in Chapter 3 explain the benefits of each of the four mass spectrometric methods, namely, the isotope dilution method, complete thermal vaporization, vacuum spark technique, and the ion bombardment method. Chapter 4 focuses on the absorption, fluorescence, and polarographic methods used in general trace analysis, including examples of semiconductor material applications and other problems that result when certain impurities are introduced into the test sample. This monograph will be useful for researchers in ultra-trace analysis, nuclear physics, and analytical chemistry.

There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.

Following the collection of a sample, every analytical chemist will agree that its subsequent preservation and processing are of paramount importance. The availability of high performance analytical instrumentation has not diminished this need for careful selection of appropriate pretreatment methodologies, intelligently designed to synergistically elicit optimum function from these powerful measurement tools. Sample Preparation for Trace Element Analysis is a modern, comprehensive treatise, providing an account of the state-of-the art on the subject matter. The book has been conceived and designed to satisfy the varied needs of the practicing analytical chemist. It is a multi-author work, reflecting the diverse expertise arising from its highly qualified contributors. The first five chapters deal with general issues related to the determination of trace metals in varied matrices, such as sampling, contamination control, reference materials, calibration and detection techniques. The second part of the book deals with extraction and sampling technologies (totaling 15 chapters), providing theoretical and practical hints for the users on how to perform specific extractions. Subsequent chapters overview seven major representative matrices and the sample preparation involved in their characterization. This portion of the book is heavily based on the preceding chapters dealing with extraction technologies. The last ten chapters are dedicated to sample preparation for trace element speciation.- First title to provide comprehensive sample preparation information, dealing specifically with the analysis of samples for trace elements. - The 39 chapters are authored by international leaders of their fields.

This exciting new handbook investigates the characterization of surfaces. It emphasizes experimental techniques for imaging of solid surfaces and theoretical strategies for visualization of surfaces, areas in which rapid progress is currently being made. This comprehensive, unique volume is the ideal reference for researchers needing quick access to the latest developments in the field and an excellent introduction to students who want to acquaint themselves with the behavior of electrons, atoms, molecules, and thin-films at surfaces. It's all here, under one cover! The Handbook of Surface Imaging and Visualization is filled with sixty-four of the most powerful techniques for characterization of surfaces and interfaces in the material sciences, medicine, biology, geology, chemistry, and physics. Each discussion is easy to understand, succinct, yet incredibly informative. Data illustrate present research in each area of study. A wide variety of the latest experimental and theoretical approaches are included with both practical and fundamental objectives in mind. Key references are included for the reader's convenience for locating the most recent and useful work on each topic. Readers are encouraged to contact the authors or consult the references for additional information. This is the best ready reference available today. It is a perfect source book or supplemental text on the subject.

The 11th Colloquium on Metallurgical Analysis - a joint venture of the Institute of Analytical Chemistry of the Technical University in Vienna, the Austrian Society for Analytical Chemistry and Microchemistry, the German Metals Society (DGM), and the Society of German Iron and Steel Engineers (VDEh) - was attended by 120 scientists from 12 nations. The major topics covered were surface, micro and trace analysis of materials with a heavy emphasis on metals. According to the strategy of the meeting attention was focussed on an interdisciplinary approach to materials science - combining analytical chemistry, solid state physics and tech nology. Therefore progress reports on analytical techniques (like SIMS, SNMS, Positron Annihilation Spectroscopy, AES, XPS) were given as well as pre sentations on the development of materials (like for the fusion reactor). The majority of the discussion papers centered on the treatment of important technical problems in materials science and technology by a (mostly sophis ticated) combination of physical and chemical analytical techniques. The intensive exchange of ideas and results between the scientists oriented towards basic research and the industrial materials technologists was very fruitful and resulted in the establishment of several scientific cooperations. Major trends in materials analysis were also dealt with in a plenary discussion of which a short summary is contained in this volume. In order to facilitate international communication in the field of materials analysis and in view of the important questions treated in the various contri butions this proceedings volume was edited in English.