The Effects Of Magnetron Flux On Magnetic Properties And Recording Performance Of Cocrptta Thin Film Media For Dc Sputtering
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Author |
: Hon Leong Wong |
Publisher |
: |
Total Pages |
: 204 |
Release |
: 1997 |
ISBN-10 |
: OCLC:969715207 |
ISBN-13 |
: |
Rating |
: 4/5 (07 Downloads) |
Synopsis The Effects of Magnetron Flux on Magnetic Properties and Recording Performance of CoCrPtTa Thin Film Media for DC Sputtering by : Hon Leong Wong
Author |
: Alberto Palmero |
Publisher |
: MDPI |
Total Pages |
: 148 |
Release |
: 2020-12-10 |
ISBN-10 |
: 9783039364299 |
ISBN-13 |
: 3039364294 |
Rating |
: 4/5 (99 Downloads) |
Synopsis Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by : Alberto Palmero
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Author |
: Al-Ahsan Talukder |
Publisher |
: |
Total Pages |
: 0 |
Release |
: 2022 |
ISBN-10 |
: 9798438736400 |
ISBN-13 |
: |
Rating |
: 4/5 (00 Downloads) |
Synopsis Reactive Ion Enhanced Magnetron Sputtering of Nitride Thin Films by : Al-Ahsan Talukder
Magnetron sputtering is a popular vacuum plasma coating technique used for depositing metals, dielectrics, semiconductors, alloys, and compounds onto a wide range of substrates. In this work, we present two popular types of magnetron sputtering, i.e., pulsed DC and RF magnetron sputtering, for depositing piezoelectric aluminum nitride (AlN) thin films with high Young's modulus. The effects of important process parameters on the plasma I-V characteristics, deposition rate, and the properties of the deposited AlN films, are studied comprehensively. The effects of these process parameters on Young's modulus of the deposited films are also presented. Scanning electron microscope imaging revealed a c-axis oriented columnar growth of AlN. Performance of surface acoustic devices, utilizing the AlN films deposited by magnetron sputtering, are also presented, which confirms the differences in qualities and microstructures of the pulsed DC and RF sputtered films. The RF sputtered AlN films showed a denser microstructure with smaller grains and a smoother surface than the pulsed DC sputtered films. However, the deposition rate of RF sputtering is about half of the pulsed DC sputtering process. We also present a novel ion source enhanced pulsed DC magnetron sputtering for depositing high-quality nitrogen-doped zinc telluride (ZnTe:N) thin films. This ion source enhanced magnetron sputtering provides an increased deposition rate, efficient N-doping, and improved electrical, structural, and optical properties than the traditional magnetron sputtering. Ion source enhanced deposition leads to ZnTe:N films with smaller lattice spacing and wider X-ray diffraction peak, which indicates denser films with smaller crystallites embedded in an amorphous matrix.
Author |
: Jong-Kai Lin |
Publisher |
: |
Total Pages |
: 624 |
Release |
: 1986 |
ISBN-10 |
: MINN:319510014679103 |
ISBN-13 |
: |
Rating |
: 4/5 (03 Downloads) |
Synopsis The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media by : Jong-Kai Lin
Author |
: |
Publisher |
: |
Total Pages |
: 2240 |
Release |
: 1997 |
ISBN-10 |
: OSU:32435059589358 |
ISBN-13 |
: |
Rating |
: 4/5 (58 Downloads) |
Synopsis Electrical & Electronics Abstracts by :
Author |
: Diederik Depla |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 584 |
Release |
: 2008-06-24 |
ISBN-10 |
: 9783540766643 |
ISBN-13 |
: 3540766642 |
Rating |
: 4/5 (43 Downloads) |
Synopsis Reactive Sputter Deposition by : Diederik Depla
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Author |
: Jaydeep Sarkar |
Publisher |
: William Andrew |
Total Pages |
: 0 |
Release |
: 2018-10-30 |
ISBN-10 |
: 012810080X |
ISBN-13 |
: 9780128100806 |
Rating |
: 4/5 (0X Downloads) |
Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. .
Author |
: Li Tang |
Publisher |
: |
Total Pages |
: 312 |
Release |
: 1992 |
ISBN-10 |
: UCAL:C3370466 |
ISBN-13 |
: |
Rating |
: 4/5 (66 Downloads) |
Synopsis Microstructure and Magnetic Properties of Cobalt-based Thin Films for Magnetic Recording by : Li Tang
Author |
: Mao-Min Chen |
Publisher |
: |
Total Pages |
: 15 |
Release |
: 1988 |
ISBN-10 |
: OCLC:19879812 |
ISBN-13 |
: |
Rating |
: 4/5 (12 Downloads) |
Synopsis Effects of Sputtering Conditions on the Recording Characteristics of Iron Oxide Thin Film Media by : Mao-Min Chen
Author |
: Alberto Palmero |
Publisher |
: |
Total Pages |
: 148 |
Release |
: 2020 |
ISBN-10 |
: 3039364308 |
ISBN-13 |
: 9783039364305 |
Rating |
: 4/5 (08 Downloads) |
Synopsis Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by : Alberto Palmero
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.