Surface Analysis By Auger And X Ray Photoelectron Spectroscopy
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Author |
: David Briggs |
Publisher |
: Im Publications |
Total Pages |
: 899 |
Release |
: 2003-01-01 |
ISBN-10 |
: 1901019047 |
ISBN-13 |
: 9781901019049 |
Rating |
: 4/5 (47 Downloads) |
Synopsis Surface Analysis by Auger and X-ray Photoelectron Spectroscopy by : David Briggs
Author |
: D. Briggs |
Publisher |
: |
Total Pages |
: 694 |
Release |
: 1990-11-30 |
ISBN-10 |
: UOM:39015024953492 |
ISBN-13 |
: |
Rating |
: 4/5 (92 Downloads) |
Synopsis Practical Surface Analysis, Auger and X-ray Photoelectron Spectroscopy by : D. Briggs
The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.
Author |
: Siegfried Hofmann |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 544 |
Release |
: 2012-10-25 |
ISBN-10 |
: 9783642273803 |
ISBN-13 |
: 3642273807 |
Rating |
: 4/5 (03 Downloads) |
Synopsis Auger- and X-Ray Photoelectron Spectroscopy in Materials Science by : Siegfried Hofmann
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author |
: John F. Watts |
Publisher |
: John Wiley & Sons |
Total Pages |
: 307 |
Release |
: 2019-08-27 |
ISBN-10 |
: 9781119417644 |
ISBN-13 |
: 1119417643 |
Rating |
: 4/5 (44 Downloads) |
Synopsis An Introduction to Surface Analysis by XPS and AES by : John F. Watts
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author |
: David Briggs |
Publisher |
: |
Total Pages |
: 533 |
Release |
: 1983 |
ISBN-10 |
: OCLC:797742091 |
ISBN-13 |
: |
Rating |
: 4/5 (91 Downloads) |
Synopsis Practical Surface Analysis by : David Briggs
Author |
: John O'Connor |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 626 |
Release |
: 2003-04-23 |
ISBN-10 |
: 3540413308 |
ISBN-13 |
: 9783540413301 |
Rating |
: 4/5 (08 Downloads) |
Synopsis Surface Analysis Methods in Materials Science by : John O'Connor
This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.
Author |
: Siegfried Hofmann |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 545 |
Release |
: 2012-10-25 |
ISBN-10 |
: 9783642273810 |
ISBN-13 |
: 3642273815 |
Rating |
: 4/5 (10 Downloads) |
Synopsis Auger- and X-Ray Photoelectron Spectroscopy in Materials Science by : Siegfried Hofmann
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author |
: Briggs D Ed |
Publisher |
: |
Total Pages |
: |
Release |
: 1983 |
ISBN-10 |
: OCLC:985893129 |
ISBN-13 |
: |
Rating |
: 4/5 (29 Downloads) |
Synopsis Practical Surface Analysis - by Auger and X-Ray Photoelectron Spectroscopy by : Briggs D Ed
Author |
: J. M. Walls |
Publisher |
: CUP Archive |
Total Pages |
: 356 |
Release |
: 1990-04-12 |
ISBN-10 |
: 052138690X |
ISBN-13 |
: 9780521386906 |
Rating |
: 4/5 (0X Downloads) |
Synopsis Methods of Surface Analysis by : J. M. Walls
Author |
: A.W. Czanderna |
Publisher |
: Elsevier |
Total Pages |
: 496 |
Release |
: 2012-12-02 |
ISBN-10 |
: 9780444596451 |
ISBN-13 |
: 0444596453 |
Rating |
: 4/5 (51 Downloads) |
Synopsis Methods of Surface Analysis by : A.W. Czanderna
Methods of Surface Analysis deals with the determination of the composition of surfaces and the identification of species attached to the surface. The text applies methods of surface analysis to obtain a composition depth profile after various stages of ion etching or sputtering. The composition at the solid—solid interface is revealed by systematically removing atomic planes until the interface of interest is reached, in which the investigator can then determine its composition. The book reviews the effect of ion etching on the results obtained by any method of surface analysis including the effect of the rate of etching, incident energy of the bombarding ion, the properties of the solid, the effect of the ion etching on generating an output signal of electrons, ions, or neutrals. The text also describes the effect of the residual gases in the vacuum environment. The book considers the influence of the sample geometry, of the type (metal, insulator, semiconductor, organic), and of the atomic number can have on surface analysis. The text describes in detail low energy ion scattering spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectroscopy, and infrared reflection-absorption spectroscopy. The book can prove useful for researchers, technicians, and scientists whose works involve organic chemistry, analytical chemistry, and other related fields of chemistry, such as physical chemistry or inorganic chemistry.