Recent Advances In Metrology Characterization And Standards For Optical Digital Data Disks
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Author |
: Fernando L. Podio |
Publisher |
: SPIE-International Society for Optical Engineering |
Total Pages |
: 196 |
Release |
: 1999 |
ISBN-10 |
: UOM:39015048513918 |
ISBN-13 |
: |
Rating |
: 4/5 (18 Downloads) |
Synopsis Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks by : Fernando L. Podio
Author |
: National Institute of Standards and Technology (U.S.) |
Publisher |
: |
Total Pages |
: 160 |
Release |
: 2000 |
ISBN-10 |
: PSU:000073567974 |
ISBN-13 |
: |
Rating |
: 4/5 (74 Downloads) |
Synopsis National Semiconductor Metrology Program by : National Institute of Standards and Technology (U.S.)
Author |
: National Semiconductor Metrology Program (U.S.) |
Publisher |
: |
Total Pages |
: 160 |
Release |
: 2000 |
ISBN-10 |
: IND:30000097563542 |
ISBN-13 |
: |
Rating |
: 4/5 (42 Downloads) |
Synopsis National Semiconductor Metrology Program by : National Semiconductor Metrology Program (U.S.)
Author |
: |
Publisher |
: |
Total Pages |
: 160 |
Release |
: 2000 |
ISBN-10 |
: STANFORD:36105050150742 |
ISBN-13 |
: |
Rating |
: 4/5 (42 Downloads) |
Synopsis National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 by :
Author |
: Marc J. Madou |
Publisher |
: CRC Press |
Total Pages |
: 1983 |
Release |
: 2018-12-14 |
ISBN-10 |
: 9781482274660 |
ISBN-13 |
: 1482274663 |
Rating |
: 4/5 (60 Downloads) |
Synopsis Fundamentals of Microfabrication and Nanotechnology, Three-Volume Set by : Marc J. Madou
Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.
Author |
: Marc J. Madou |
Publisher |
: CRC Press |
Total Pages |
: 652 |
Release |
: 2011-06-13 |
ISBN-10 |
: 9781420055160 |
ISBN-13 |
: 142005516X |
Rating |
: 4/5 (60 Downloads) |
Synopsis From MEMS to Bio-MEMS and Bio-NEMS by : Marc J. Madou
From MEMS to Bio-MEMS and Bio-NEMS: Manufacturing Techniques and Applications details manufacturing techniques applicable to bionanotechnology. After reviewing MEMS techniques, materials, and modeling, the author covers nanofabrication, genetically engineered proteins, artificial cells, nanochemistry, and self-assembly. He also discusses scaling laws in MEMS and NEMS, actuators, fluidics, and power and brains in miniature devices. He concludes with coverage of various MEMS and NEMS applications. Fully illustrated in color, the text contains end-of-chapter problems, worked examples, extensive references for further reading, and an extensive glossary of terms. Details the Nanotechnology, Biology, and Manufacturing Techniques Applicable to Bionanotechnology Topics include: Nonlithography manufacturing techniques with lithography-based methods Nature as an engineering guide and contrasts top-down and bottom-up approaches Packaging, assembly, and self-assembly from ICs to DNA and biological cells Selected new MEMS and NEMS processes and materials, metrology techniques, and modeling Scaling laws, actuators, power generation, and the implementation of brains in miniaturizes devices Different strategies for making micromachines smarter The transition out of the laboratory and into the marketplace The third volume in Fundamentals of Microfabrication and Nanotechnology, Third Edition, Three-Volume Set, the book discusses top-down and bottom-up manufacturing methods and explains how to use nature as a guide. It provides a better understanding of how to match different manufacturing options with a given application that students can use to identify additional killer MEMS and NEMS applications. Other volumes in the set include: Solid-State Physics, Fluidics, and Analytical Techniques in Micro- and Nanotechnology Manufacturing Techniques for Microfabrication and Nanotechnology
Author |
: |
Publisher |
: |
Total Pages |
: 366 |
Release |
: 2000 |
ISBN-10 |
: UOM:39015048234663 |
ISBN-13 |
: |
Rating |
: 4/5 (63 Downloads) |
Synopsis Summaries of Papers Presented at the Optical Data Storage Topical Meeting by :
Author |
: |
Publisher |
: |
Total Pages |
: 416 |
Release |
: 1968 |
ISBN-10 |
: STANFORD:36105130366201 |
ISBN-13 |
: |
Rating |
: 4/5 (01 Downloads) |
Synopsis NBS Special Publication by :
Author |
: David G. Seiler |
Publisher |
: American Institute of Physics |
Total Pages |
: 868 |
Release |
: 2003-10-08 |
ISBN-10 |
: UOM:39015052982736 |
ISBN-13 |
: |
Rating |
: 4/5 (36 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology: 2003 by : David G. Seiler
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Topics include: integrated circuit history, challenges and overviews, front end, lithography, interconnect and back end, and critical analytical techniques. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The editors believe that this book of collected papers provides a concise and effective portrayal of industry characterization needs and the way they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. Hopefully, it will also provide a basis for stimulating advances in metrology and new ideas for research and development.
Author |
: National Institute of Standards and Technology (U.S.) |
Publisher |
: |
Total Pages |
: 410 |
Release |
: 1986 |
ISBN-10 |
: UIUC:30112101564885 |
ISBN-13 |
: |
Rating |
: 4/5 (85 Downloads) |
Synopsis Publications of the National Institute of Standards and Technology ... Catalog by : National Institute of Standards and Technology (U.S.)