Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating

The unique properties and functionalities of chalcogenide glasses make them promising materials for photonic applications. Chalcogenide glasses are transparent from the visible to the near infrared region and can be moulded into lenses or drawn into fibres. They have useful commercial applications as components for lenses for infrared cameras, and chalcogenide glass fibres and optical components are used in waveguides for use with lasers, for optical switching, chemical and temperature sensing and phase change memories. Chalcogenide glasses comprehensively reviews the latest technological advances in this field and the industrial applications of the technology.Part one outlines the preparation methods and properties of chalcogenide glasses, including the thermal properties, structure, and optical properties, before going on to discuss mean coordination and topological constraints in chalcogenide network glasses, and the photo-induced phenomena in chalcogenide glasses. This section also covers the ionic conductivity and physical aging of chalcogenide glasses, deposition techniques for chalcogenide thin films, and transparent chalcogenide glass-ceramics. Part two explores the applications of chalcogenide glasses. Topics discussed include rare-earth-doped chalcogenide glass for lasers and amplifiers, the applications of chalcogenide glasses for infrared sensing, microstructured optical fibres for infrared applications, and chalcogenide glass waveguide devices for all-optical signal processing. This section also discusses the control of light on the nanoscale with chalcogenide thin films, chalcogenide glass resists for lithography, and chalcogenide for phase change optical and electrical memories. The book concludes with an overview of chalcogenide glasses as electrolytes for batteries.Chalcogenide glasses comprehensively reviews the latest technological advances and applications of chalcogenide glasses, and is an essential text for academics, materials scientists and electrical engineers working in the photonics and optoelectronics industry. - Outlines preparation methods and properties, and explores applications of chalcogenide glasses. - Covers the ionic conductivity and physical aging of chalcogenide glasses, deposition techniques for chalcogenide thin films, and transparent chalcogenide glass-ceramics - Discusses the control of light on the nanoscale with chalcogenide thin films, chalcogenide glass resists for lithography, and chalcogenide for phase change optical and electrical memories

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes

The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.

This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

Materials Processing is the first textbook to bring the fundamental concepts of materials processing together in a unified approach that highlights the overlap in scientific and engineering principles. It teaches students the key principles involved in the processing of engineering materials, specifically metals, ceramics and polymers, from starting or raw materials through to the final functional forms. Its self-contained approach is based on the state of matter most central to the shaping of the material: melt, solid, powder, dispersion and solution, and vapor. With this approach, students learn processing fundamentals and appreciate the similarities and differences between the materials classes. The book uses a consistent nomenclature that allow for easier comparisons between various materials and processes. Emphasis is on fundamental principles that gives students a strong foundation for understanding processing and manufacturing methods. Development of connections between processing and structure builds on students' existing knowledge of structure-property relationships. Examples of both standard and newer additive manufacturing methods throughout provide students with an overview of the methods that they will likely encounter in their careers. This book is intended primarily for upper-level undergraduates and beginning graduate students in Materials Science and Engineering who are already schooled in the structure and properties of metals, ceramics and polymers, and are ready to apply their knowledge to materials processing. It will also appeal to students from other engineering disciplines who have completed an introductory materials science and engineering course. - Coverage of metal, ceramic and polymer processing in a single text provides a self-contained approach and consistent nomenclature that allow for easier comparisons between various materials and processes - Emphasis on fundamental principles gives students a strong foundation for understanding processing and manufacturing methods - Development of connections between processing and structure builds on students' existing knowledge of structure - property relationships - Examples of both standard and newer additive manufacturing methods throughout provide students with an overview of the methods that they will likely encounter in their careers

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures. Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.