This unique monograph series "Progress in Nano-Electro Optics" reviews the results of advanced studies of electro-optics on the nanometric scale. This third volume covers the most recent topics of theoretical and experimental interest including classical and quantum optics, organic and inorganic material science and technology, surface science, spectroscopy, atom manipulation, photonics, and electronics. The first two volumes addressed the "Basics and Theory of Near Field Optics" (2002) and "Novel Devices and Atom Manipulation" (2003).

This volume focuses on nano-optical probing, manipulation, and analysis. It begins with recent developments in near-field optical spectroscopy that clarify quantum states at the nanoscale, followed by a theory for a photon-electron-phonon interacting system at the nanoscale. Further topics include: visible laser desorption/ionization mass spectroscopy exhibiting near-field effects; a practical nanofabrication method with optical near fields applied to a SHG device; a theory and experimental achievements on optical transport of nanoparticles, selectively manipulated by resonant radiation force. Taken as a whole, this overview will be a valuable resource for engineers and scientists working in the field of nano-electro-optics.

This book focuses on chemical and nanophotonic technology to be used to develop novel nano-optical devices and systems. It begins with temperature- and photo-induced phase transition of ferromagnetic materials. Further topics include: energy transfer in artificial photosynthesis, homoepitaxial multiple quantum wells in ZnO, near-field photochemical etching and nanophotonic devices based on a nonadiabatic process and optical near-field energy transfer, respectively and polarization control in the optical near-field for optical information security. Taken as a whole, this overview will be a valuable resource for engineers and scientists working in the field of nano-electro-optics.

An up-to-date status report presenting the current state-of-the-art in nano-optics, this volume also deals with near-field optical microscopy. Each chapter is written by a leading scientist in the field. It will be useful to all researchers working at the forefront of near-field optics and nanoelectro-optics.

This second and concluding volume of Progress in Nano-Electro-Optics focuses on applications to novel devices and atom manipulation. Part II addresses the latest developments in nano-optical techniques, forming a valuable resource for engineers and scientists working in the field of nano-electro-optics.

Focuses on fundamental aspects of nano-electro-optics. Starting with fiber probes and related devices for generating and detecting the optical near-field with high efficiency and resolution, the next chapter addresses the modulation of an electron beam by optical near-fields. Further topics include: fluorescence spectroscopy, in which sample molecules are excited by the evanescent surface plasmon field close to metallic surfaces; spatially resolved near-field photoluminescence spectroscopy of semiconductor quantum dots, which will become an essential issue in future electro-optical devices and systems; and, finally, the quantum theory of the optical near-field. This latter theory accounts for all the essential features of the interaction between optical near-fields and nanomaterials, atoms and molecules.

Focusing on nanophotonics, which has been proposed by M. Ohtsu in 1993, this volume begins with theories for operation principles of characteristic nanophotonic devices and continues with novel optical near field phenomena for fabricating nanophotonic devices. Further topics include: unique properties of optical near fields and their applications to operating nanophotonic devices; and nanophotonic information and communications systems that can overcome the integration-density limit with ultra-low-power operation as well as unique functionalities. Taken as a whole, this overview will be a valuable resource for engineers and scientists working in the field of nano-electro-optics.

The papers in this volume cover the major areas of research activity in the field of ultrafast optics at the present time, and they have been selected to provide an overview of the current state of the art. The purview of the field is the methods for the generation, amplification, and characterization of electromagnetic pulses with durations from the pieo-to the attosecond range, as well as the technical issues surrounding the application of these pulses in physics, chemistry, and biology. The contributions were solicited from the participants in the Ultrafast Optics IV Conference, held in Vienna, Austria, in June 2003. The purpose of the conference is similar to that of this book: to provide a forum for the latest advances in ultrafast optical technology. Ultrafast light sources provide a means to observe and manipulate events on the scale of atomic and molecular dynamics. This is possible either through appropriate shaping of the time-dependent electrie field, or through the ap plication of fields whose strength is comparable to the binding forces of the electrons in atoms and molecules. Recent advances discussed here include the generation of pulses shorter than two optical cycles, and the ability to measure and to shape them in all degrees of freedom with unprecedented 2 21 2 precision, and to amplify them to the Zettawatt/cm (10 W /cm ) range.

Optical Interconnects provides a fascinating picture of the state of the art in optical interconnects and a perspective on what can be expected in the near future. It is composed of selected reviews authored by world leaders in the field, and these reviews are written from either an academic or industrial viewpoint. An in-depth discussion of the path towards fully-integrated optical interconnects in microelectronics is presented. This book will be useful not only to physicists, chemists, materials scientists, and engineers but also to graduate students who are interested in the fields of microelectronics and optoelectronics.

The use of x rays has moved in the forefront of science and technology in the second half of the 20th century. This progress has been greatly stimulated by the advent of synchrotron x-ray sources in the 1960s. The undulator-based synchrotron radiation sources which have appeared in the last decade of the 20th century gave a new impetus to such development. The brilliance of the x-ray sources has increased by 12 orders of magnitude in 40 years and this trend does not show any signs of stagnation. The future x-ray sources of the 21th century based on free-electron lasers driven by linear accelerators will provide sub-picosecond radiation pulses with by many orders of magnitude higher brilliance and full transverse coherence. The x-ray sources of the newest generation offer a possibility to realize more than ever before the great potential of x-ray optics and, as a consequence, to elaborate new sophisticated instrumentation with unprecedented resolution and eventually to move in new directions of research in x-ray technology, materials science, fundamental physics, life sciences, etc.