The development of photosensitive materials in general and photoreactive polymers in particular is responsible for major advances in the information, imaging, and electronic industries. Computer parts manufacturing, information storage, and book and magazine publishing all depend on photoreactive polymer systems. The photo-and radiation-induced processes in polymers are also active areas of research. New information on the preparation and properties of com mercially available photosensitive systems is constantly being acquired. The recent demand for environmentally safe solvent-free and water-soluble materials also motivated changes in the composition of photopolymers and photoresists. The interest in holographic recording media for head-up displays, light scanners, and data recording stimulated development of reconfigurable and visible light sensitive materials. Photoconductive polymerizable coatings are being tested in electrostatic proofing and color printing. The list of available initiators, poly meric binders, and other coating ingredients is continually evolving to respond to the requirements of low component loss (low diffusivity) and the high rate of photochemical reactions.

Photochemical Processes in Polymer Chemistry-2 contains invited lectures presented at the Second IUPAC Symposium on Photochemical Processes in Polymer Chemistry held at Leuven, Belgium on June 2-4, 1976. This book contains 11 papers separated as chapters. Topics include energy transfer processes; photoinitiation of polymerization; solid-state polymerization mechanisms; photoinduced ionic polymerizations; and photoconductive polymers. This text also discusses energy transfer phenomena in high polymer systems; laser spectroscopical methods for the study of primary processes during the photodegradation; photooxidation of high polymers; and reaction selectivity and molecular association in photochemical reactions of nucleic acids and their constituents. New developments in photochromic polymers and related phenomena, as well as the design of photoreactive polymer systems for imaging processes are also explained.

The development of photosensitive materials in general and photoreactive polymers in particular is responsible for major advances in the information, imaging, and electronic industries. Computer parts manufacturing, information storage, and book and magazine publishing all depend on photoreactive polymer systems. The photo-and radiation-induced processes in polymers are also active areas of research. New information on the preparation and properties of com mercially available photosensitive systems is constantly being acquired. The recent demand for environmentally safe solvent-free and water-soluble materials also motivated changes in the composition of photopolymers and photoresists. The interest in holographic recording media for head-up displays, light scanners, and data recording stimulated development of reconfigurable and visible light sensitive materials. Photoconductive polymerizable coatings are being tested in electrostatic proofing and color printing. The list of available initiators, poly meric binders, and other coating ingredients is continually evolving to respond to the requirements of low component loss (low diffusivity) and the high rate of photochemical reactions.

"Nearly all companies which manufacture or fabricate high-value physical objects (components, parts, assemblies) perform critical cleaning at one or more stages. These range from the giants of the semiconductor, aerospace, and biomedical world to a host of small to medium to large companies producing a dizzying array of components"--

Radical polymerization is one of the most widely used means of producing vinyl polymers, supporting a myriad of commercial uses. Maintaining the quality of the critically acclaimed first edition, the Handbook of Vinyl Polymers: Radical Polymerization, Process, and Technology, Second Edition provides a fully updated, single-volume source on t

This first book to focus on the important and topical effect of light on polymeric materials reflects the multidisciplinary nature of the topic, building a bridge between polymer chemistry and physics, photochemistry and photophysics, and materials science. Written by one experienced author, a consistent approach is maintained throughout, covering such applications as nonlinear optical materials, core materials for optical waveguides, photoresists in the production of computer chips, photoswitches and optical memories. Advanced reading for polymer, physical and organic chemists, manufacturers of optoelectronic devices, chemical engineers, and materials scientists.

Maintaining a balance between depth and breadth, the Sixth Edition of Principles of Polymer Systems continues to present an integrated approach to polymer science and engineering. A classic text in the field, the new edition offers a comprehensive exploration of polymers at a level geared toward upper-level undergraduates and beginning graduate students. Revisions to the sixth edition include: A more detailed discussion of crystallization kinetics, strain-induced crystallization, block copolymers, liquid crystal polymers, and gels New, powerful radical polymerization methods Additional polymerization process flow sheets and discussion of the polymerization of polystyrene and poly(vinyl chloride) New discussions on the elongational viscosity of polymers and coarse-grained bead-spring molecular and tube models Updated information on models and experimental results of rubber elasticity Expanded sections on fracture of glassy and semicrystalline polymers New sections on fracture of elastomers, diffusion in polymers, and membrane formation New coverage of polymers from renewable resources New section on X-ray methods and dielectric relaxation All chapters have been updated and out-of-date material removed. The text contains more theoretical background for some of the fundamental concepts pertaining to polymer structure and behavior, while also providing an up-to-date discussion of the latest developments in polymerization systems. Example problems in the text help students through step-by-step solutions and nearly 300 end-of-chapter problems, many new to this edition, reinforce the concepts presented.

The first English edition of this book was pubUshed in 1971 with the late Prof. Dr. Werner Kern as coauthor. In 1997, for the preparation of the third edition, Prof. Dr. Helmut Ritter joined the team of authors and in 2001 Prof. Dr. Brigitte Voit and Prof. Dr. Matthias Rehahn complemented this team. The change in authors has not altered the basic concept of this 4th edition: again we were not aimed at compiling a comprehensive collection of recipes. In stead, we attempted to reach a broader description of the general methods and techniques for the synthesis, modification, and characterization of macromo- cules, supplemented by 105 selected and detailed experiments and by sufficient theoretical treatment so that no additional textbook be needed in order to under stand the experiments. In addition to the preparative aspects we have also tried to give the reader an impression of the relation of chemical structure and mor phology of polymers to their properties, as well as of areas of their application.

This first book to cover the interaction of polymers with radiation from the entire electromagnetic spectrum adopts a multidisciplinary approach to bridge polymer chemistry and physics, photochemistry, photophysics and materials science. The text is equally unique in its scope, devoting equal amounts of attention to the three aspects of synthesis, characterization, and applications. The first part deals with the interaction of polymers with non-ionizing radiation in the frequency-range from sub-terahertz via infrared radiation to visible and ultraviolet light, while the second covers interaction with ionizing radiation from the extreme ultraviolet to ?-ray photons. The result is a systematic overview of how both types of radiation can be used for different polymerization approaches, spectroscopy methods and lithography techniques. Authored by a world-renowned researcher and teacher with over 40 years of experience in the field, this is a highly practical and authoritative guide.

Proceedings of the Third EEC Workshop on Photochemical, Photoelectrochemical and Photobiological Research and Development, London, 18-21 April 1989.