This issue of ECS Transactions contains papers presented at the International Symposium on Plasma Processing. The symposium, 17th in the series, cosponsored by the Dielectric Science & Technology, Electronics, and Photonics Divisions was held as part of the 213th Meeting of The Electrochemical Society, Inc., in Phoenix, AZ, USA, May 18 - 23, 2008. A total of 14 papers were presented from Belgium, Germany, Italy, Japan, Republic of Korea, Russia, and the USA on topics mainly focused on diagnostics & measurements and etching & deposition processes.

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.

Plasma & High Frequency Processes for Obtaining & Processing Materials in the Nuclear Fuel Cycle

A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames. Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study. The book also includes: • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning • In-depth examinations of microwave plasma systems for plasma processing at varied parameters Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.

This volume deals with the basic knowledge and understanding of the fundamental interactions of low-energy electrons with molecules. Recent advances in electron-molecule interaction processes are discussed and a unique up-to-date and comprehensive account of the fundamental interactions of low-energy electrons with molecules of current interest in modern technology, specially the semiconductor industry, is presented. The material provided in this volume will aid scientists and engineers working in many fields of basic and applied science and engineering. The unique and authoritative knowledge, information, and understanding it provides generically underpins advances in plasma, laser, lighting, discharge, environmental, radiation, and other technologies.

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.