Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

This book describes the physical mechanism of high-frequency (radio-frequency) capacitive discharge (RFCD) of low and medium pressure and the properties of discharge plasma in detail. The main properties and characteristics of RFCD, the features of electric breakdown in a high-frequency field are also investigated. The properties of near-electrode layers of a spatial discharge, the nature of the electric field in them, and the processes of charge transport to electrodes are explored. The work is intended for scientists engaged in gas discharge physics and low-temperature plasmas, graduate students and students of physics, physical chemistry, and relevant specialties.

This rigorous explanation of plasmas is relevant to diverse plasma applications such as controlled fusion, astrophysical plasmas, solar physics, magnetospheric plasmas, and plasma thrusters. More thorough than previous texts, it exploits new powerful mathematical techniques to develop deeper insights into plasma behavior. After developing the basic plasma equations from first principles, the book explores single particle motion with particular attention to adiabatic invariance. The author then examines types of plasma waves and the issue of Landau damping. Magnetohydrodynamic equilibrium and stability are tackled with emphasis on the topological concepts of magnetic helicity and self-organization. Advanced topics follow, including magnetic reconnection, nonlinear waves, and the Fokker–Planck treatment of collisions. The book concludes by discussing unconventional plasmas such as non-neutral and dusty plasmas. Written for beginning graduate students and advanced undergraduates, this text emphasizes the fundamental principles that apply across many different contexts.

The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.

Low temperature plasmas have had a very broad range of applications ever since their discovery. However, recent developments in the dextrous handling of dry etching non-equilibrium plasma have attracted a great common interest that has driving force behind the major developments in diagnostic, theoretical and numerical techniques since the 1980s. A greater fundamental understanding of the kinetics of radio-frequency (rf) plasmas and their interaction with surfaces in regard to the process of large scale integrated circuits has been achieved through the cooperation between academia and industry. At the same time, new applications have become possible, and the basic understanding of low temperature rf plasmas has diffused to other areas of plasma physics. in the special issue of Applied Surface Science, which is published in memory of the International Workshop on Basis for Low Temperature Plasma Applications at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection of topics was to cover the range of issues that represent the building blocks of the complex, vertically integrated plasma simulation schemes including surface processes. The text also shows examples of integrated codes and how they are implemented in the development of new strategies of plasma processing. Such codes may be used both in modern experiments and in the computer aided design and control of the plasma devices of the next generation. These are based on the transport theory of electrons, ions and neutrals, as well as on numerical modellings and on the available collision and transport data describing gas and surface phases. density plasmas. All the chapters present a relatively complete review of the developments in these fields since the 1980s as well as a review of their status of development in 2002, and there is a blend of research reviews from both academia and industry.

Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.

Introduction to Plasma Physics is the standard text for an introductory lecture course on plasma physics. The text's six sections lead readers systematically and comprehensively through the fundamentals of modern plasma physics. Sections on single-particle motion, plasmas as fluids, and collisional processes in plasmas lay the groundwork for a thorough understanding of the subject. The authors take care to place the material in its historical context for a rich understanding of the ideas presented. They also emphasize the importance of medical imaging in radiotherapy, providing a logical link to more advanced works in the area. The text includes problems, tables, and illustrations as well as a thorough index and a complete list of references.

Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.

This book highlights plasma science and technology-related research and development work at institutes and universities networked through Asian African Association for Plasma Training (AAAPT) which was established in 1988. The AAAPT, with 52 member institutes in 24 countries, promotes the initiation and intensification of plasma research and development through cooperation and technology sharing. With 13 chapters on fusion-relevant, laboratory and industrial plasmas for wide range of applications and basic research and a chapter on AAAPT network, it demonstrates how, with collaborations, high-quality, industrially relevant academic and scientific research on fusion, industrial and laboratory plasmas and plasma diagnostics can be successfully pursued in small research labs. These plasma sciences and technologies include pioneering breakthroughs and applications in (i) fusion relevant research in the quest for long-term, clean energy source development using high-temperature, high- density plasmas and (ii) multibillion-dollar, low-temperature, non-equilibrium and thermal industrial plasmas used in processing, synthesis and electronics.