This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.

This work comprises the proceedings of the Fourth Symposium on Particles on Surfaces. Papers cover: adhesion-induced deformations of particles on surfaces; the use of atomic force microscopy in probing particle-particle adhesion; particle contamination in microelectronics, on spacecraft, and on optical surfaces; the role of air ionization in reducing surface contamination by particles in the cleanroom; abrasive blasting media for contamination-free deburring processes; and more.;The book is intended for physical, chemical, surface and colloid chemists, materials scientists; polymers, plastics, electrical and electronics, computer, chemical and mechanical engineers; and upper-level undergraduate and graduate students in these disciplines.

This volume chronicles the proceedings of the Third Symposium on Particles on Surfaces : Detection, Adhesion and Removal held as a part of the 21st Annual Meeting of the Fine Particle Society in San Diego , California, August 21 - 25 , 1990 . The first two symposia i n t h i s series were held in 1986 and 1988 , respectively, and have been properly l documented ,2. Li ke its antecedent s the Third symposium was very well received, and the continuing success of these symposia reinforced our earlier belief that regular symposia on the topic of particles on surfaces were very much needed. Concomitantly, the fourth symposium in this series is planned in Las Vegas , July 13-17 , 199 2 . l As pointed out in the Preface to the earlier two volumes ,2, the topic of particles on surfaces is of tremendous interest and concern in a wide spectrum of technological areas . The objectives of the Third symposium were es s ent i a l ly the same as those of the earlier two and our intent her e was to provide an update on the research and development activities in the world of particles on surfaces . Apropos , there has been a deliberate attempt every time to s eek out new people to present their research results and we have been very succes s f ul in this mission.

This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book. The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.

This comprehensive reference collects fundamental theories and recent research from a wide range of fields including biology, biochemistry, physics, applied mathematics, and computer, materials, surface, and colloid science-providing key references, tools, and analytical techniques for practical applications in industrial, agricultural, and forensic processes, as well as in the production of natural and synthetic compounds such as foods, minerals, paints, proteins, pharmaceuticals, polymers, and soaps.

This document provides guidance for sampling surface and subsurface sediment from wadable gravel-and cobble-bed streams. After a short introduction to streams types and classifications in gravel-bed rivers, the document explains the field and laboratory measurement of particle sizes and the statistical analysis of particle-size distributions. Analysis of particle parameters, including shape, density, and bulk density are also discussed. The document describes the spatial variability of bed-material particle sizes as well as the horizontal and vertical structure of particle deposits. The discussion of sampling procedures and equipment helps the user to make appropriate selections that support the sampling objective. Sample-size estimates may be obtained from empirical data or computed from statistical relationships between sample size and accuracy. The document explains a variety of methods, their usage and prerequisites. A detailed discussion of sampling schemes guides the user to select appropriate spatial sampling patterns necessary to produce representative samples.

Interfacial Separation of Particles is concerned with the processing and separation of fine solid particles in liquid solutions using interfacial technology.Interfacial separation has been finding wide application in many industrial fields, such as pigment and filler production, mineral processing, environmental protection, hydrometallurgy, bioengineering, food and beverage industry and chemical industry. This book describes all interfacial separation techniques and discusses the general and specific fundamentals of the techniques. The book intends to promote theoretical understanding and the more promising developments of interfacial separation technology whilst broadening the reader's background knowledge of industrial suspensions.* Is clearly written based on strong systematic science fundamentals* Provides comprehensive coverage on particle technology, mineral processing and water treatment* Includes practical examples from the different industrial fields

Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.• Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical.• A single source document addressing everything from the sources of contamination to their removal and prevention.• Amply referenced and profusely illustrated.

This book covers the development of both experiment and theory in natural surface particle chemistry. It emphasizes insights gained over the past few years, and concentrates on molecular spectroscopy, kinetics, and equilibrium as they apply to natural particle surface reactions in aqueous media. The discussion, divided among five chapters, is complemented by lengthy annotations, reading suggestions, and end-of-chapter problem sets that require a critical reading of important technical journal articles.