Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, etc., are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source. Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.

Contains papers from a May 2000 symposium, representing the state of the art in areas of dielectric materials science and process integration. Papers are arranged in sections on low and high dielectric constant materials, covering topics such as ammonia plasma passivation effects on properties of post-CMP low-k HSQ, characterization of ashing effects on low-k dielectric films, and electron beam curing of thin film polymer dielectrics. Other subjects include characterization of high-k dielectrics using the non-contact surface charge profiler method, and processing effects and electrical evaluation of ZrO2 formed by RTP oxidation of Zr. Loboda is affiliated with Dow Corning Corporation. c. Book News Inc.

The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.

"The book Dielectric Materials and Applications focuses on the recent research advancements in the area of dielectrics that can be utilized in a variety of technology-oriented applications. The topics covered in this book include the investigations of materials having low dielectric constants for Cu interconnects, a two-layer metallic waveguide as a tool to determine the complex permittivity of liquids and/or clinical diagnostics, microwave dielectric materials for the miniaturization of portable electronic devices, microwave assisted heating of dielectric and composite materials, and the dielectric properties of certain 3D nanocomposites. The other areas of discussion encapsulate the modeling of supershaped dielectric lens antennas, the roles of dielectric mediums in metamaterials to realize photonic devices ranging from absorbers, sensors and communication systems. Some of the chapters are purely experimental, whereas some others are based on modeling and simulation. Reading this volume truly remains key to understanding novel applications of dielectric materials in different areas of technological interest"--

Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for

Microwave dielectric materials play a key role in our global society with a wide range of applications, from terrestrial and satellite communication including software radio, GPS, and DBS TV to environmental monitoring via satellite. A small ceramic component made from a dielectric material is fundamental to the operation of filters and oscillators in several microwave systems. In microwave communications, dielectric resonator filters are used to discriminate between wanted and unwanted signal frequencies in the transmitted and received signal. When the wanted frequency is extracted and detected, it is necessary to maintain a strong signal. For clarity it is also critical that the wanted signal frequencies are not affected by seasonal temperature changes. In order to meet the specifications of current and future systems, improved or new microwave components based on dedicated dielectric materials and new designs are required. The recent progress in microwave telecommunication, satellite broadcasting and intelligent transport systems (ITS) has resulted in an increased demand for Dielectric Resonators (DRs). With the recent revolution in mobile phone and satellite communication systems using microwaves as the propagation media, the research and development in the field of device miniaturization has been a major challenge in contemporary Materials Science. In a mobile phone communication, the message is sent from a phone to the nearest base station, and then on via a series of base stations to the other phone. At the heart of each base station is the combiner/filter unit which has the job of receiving the messages, keeping them separate, amplifying the signals and sending then onto the next base station. For such a microwave circuit to work, part of it needs to resonate at the specific working frequency. The frequency determining component (resonator) used in such a high frequency device must satisfy certain criteria. The three important characteristics required for a dielectric resonator are (a) a high dielectric constant which facilitates miniaturization (b) a high quality factor (Qxf) which improves the signal-to-noise ratio, (c) a low temperature coefficient of the resonant frequency which determines the stability of the transmitted frequency. During the past 25 years scientists the world over have developed a large number of new materials (about 3000) or improved the properties of known materials. About 5000 papers have been published and more than 1000 patents filed in the area of dielectric resonators and related technologies. This book brings the data and science of these several useful materials together, which will be of immense benefit to researchers and engineers the world over. The topics covered in the book includes factors affecting the dielectric properties, measurement of dielectric properties, important low loss dielectric material systems such as perovskites, tungsten bronze type materials, materials in BaO-TiO2 system, (Zr,Sn)TiO4, alumina, rutile, AnBn-1O3n type materials, LTCC, ceramic-polymer composites etc. The book also has a data table listing all reported low loss dielectric materials with properties and references arranged in the order of increasing dielectric constant. - Collects together in one source data on all new materials used in wireless communication - Includes tabulated properties of all reported low loss dielectric materials - In-depth treatment of dielectric resonator materials