Introduction To Focused Ion Beams
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Author |
: Lucille A. Giannuzzi |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 380 |
Release |
: 2004-11-19 |
ISBN-10 |
: 0387231161 |
ISBN-13 |
: 9780387231167 |
Rating |
: 4/5 (61 Downloads) |
Synopsis Introduction to Focused Ion Beams by : Lucille A. Giannuzzi
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
Author |
: Jon Orloff |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 304 |
Release |
: 2012-12-06 |
ISBN-10 |
: 9781461507659 |
ISBN-13 |
: 1461507650 |
Rating |
: 4/5 (59 Downloads) |
Synopsis High Resolution Focused Ion Beams: FIB and its Applications by : Jon Orloff
In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.
Author |
: D Cox |
Publisher |
: Myprint |
Total Pages |
: 84 |
Release |
: 2015-10-12 |
ISBN-10 |
: 1681747936 |
ISBN-13 |
: 9781681747934 |
Rating |
: 4/5 (36 Downloads) |
Synopsis Introduction to Focused Ion Beam Nanometrology by : D Cox
Author |
: Lucille A. Giannuzzi |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 362 |
Release |
: 2006-05-18 |
ISBN-10 |
: 9780387233130 |
ISBN-13 |
: 038723313X |
Rating |
: 4/5 (30 Downloads) |
Synopsis Introduction to Focused Ion Beams by : Lucille A. Giannuzzi
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
Author |
: David C. Cox |
Publisher |
: Morgan & Claypool Publishers |
Total Pages |
: 119 |
Release |
: 2015-10-01 |
ISBN-10 |
: 9781681741482 |
ISBN-13 |
: 1681741482 |
Rating |
: 4/5 (82 Downloads) |
Synopsis Introduction to Focused Ion Beam Nanometrology by : David C. Cox
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Author |
: Zengliang Yu |
Publisher |
: Springer |
Total Pages |
: 0 |
Release |
: 2014-11-05 |
ISBN-10 |
: 1489999213 |
ISBN-13 |
: 9781489999214 |
Rating |
: 4/5 (13 Downloads) |
Synopsis Introduction to Ion Beam Biotechnology by : Zengliang Yu
Introduction to Ion Bean Biotechnology presents an comprehensive primer on radiation-induced mutations and implantation of charged particles altering biological development. As such, its one of the most intriging and leading tools in bioengineering cells. IIBB cover the physics of ions particles, the biological effects of ion implantations in cells, and the subsequent use in bacteria, in viruses, and in plants. IIBB covers important areas: Inducing genetic mutations on the molecular level Inducing cells to catalyze targeted gene transfer Ion beam technology is a new area, still very young IIBB will be essentinal reading for any student, reseacher, or industry professional seeking to understand and master the mechanisms of such mutations.
Author |
: Ishaq Ahmad |
Publisher |
: BoD – Books on Demand |
Total Pages |
: 190 |
Release |
: 2018-07-18 |
ISBN-10 |
: 9781789234145 |
ISBN-13 |
: 178923414X |
Rating |
: 4/5 (45 Downloads) |
Synopsis Ion Beam Applications by : Ishaq Ahmad
Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.
Author |
: Nan Yao |
Publisher |
: Cambridge University Press |
Total Pages |
: 496 |
Release |
: 2007-09-13 |
ISBN-10 |
: 9781107320567 |
ISBN-13 |
: 1107320569 |
Rating |
: 4/5 (67 Downloads) |
Synopsis Focused Ion Beam Systems by : Nan Yao
The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
Author |
: Michael Nastasi |
Publisher |
: Cambridge University Press |
Total Pages |
: 572 |
Release |
: 1996-03-29 |
ISBN-10 |
: 9780521373760 |
ISBN-13 |
: 052137376X |
Rating |
: 4/5 (60 Downloads) |
Synopsis Ion-Solid Interactions by : Michael Nastasi
Comprehensive guide to an important materials science technique for students and researchers.
Author |
: Miklos Szilagyi |
Publisher |
: Springer Science & Business Media |
Total Pages |
: 550 |
Release |
: 2012-12-06 |
ISBN-10 |
: 9781461309239 |
ISBN-13 |
: 1461309239 |
Rating |
: 4/5 (39 Downloads) |
Synopsis Electron and Ion Optics by : Miklos Szilagyi
The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.