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High pressure technology is used so extensively that it is almost impossible to catalogue the manyways in which our lives are enhanced by it. From pneumatic tires and household water supplies tomaterials such as crystals, plastics, and even synthetic diamond, there are countless materialsfabricated or shaped using high pressure technology. High Pressure Technology (in two volumes)presents the most up-to-date information available on the main features of this broad technology andthe processes which utilize it.Volume I: Equipment Design, Materials, and Properties covers three broad areas: the general operationof high pressure systems, including standard operating procedures and safety codes and measures;the technology of high pressure systems, such as components, vessel design, and materials of construction;and applied science at high pressure, including the properties of fluids and solids andmechanical properties. Volume II: Applications and Processes covers processes at high pressure andencompasses such topics as: catalytic chemical synthesis; polymerization; phase changes; criticalphenomena; liquefaction of gases; synthesis of single-crystal materials, diamond, and superhardmaterials; isostatic compacting; isostatic hot-pressing; hydrostatic forming of metals; hydraulic cutting;and applications of shock techniques.Written by recognized authorities in industry, government laboratories, and universities, High PressureTechnology is essential reading for the industrial practitioner, high pressure engineer, and researchscientist. In addition, it is a valuable textbook for students in mechanical, chemical, and materialsengineering courses.

High pressure technology is used so extensively that it is almost impossible to catalogue the manyways in which our lives are enhanced by it. From pneumatic tires and household water supplies tomaterials such as crystals, plastics, and even synthetic diamond, there are countless materialsfabricated or shaped using high pressure technology. High Pressure Technology (in two volumes)presents the most up-to-date information available on the main features of this broad technology andthe processes which utilize it.Volume I: Equipment Design, Materials, and Properties covers three broad areas: the general operationof high pressure systems, including standard operating procedures and safety codes and measures;the technology of high pressure systems, such as components, vessel design, and materials of construction;and applied science at high pressure, including the properties of fluids and solids andmechanical properties. Volume II: Applications and Processes covers processes at high pressure andencompasses such topics as: catalytic chemical synthesis; polymerization; phase changes; criticalphenomena; liquefaction of gases; synthesis of single-crystal materials, diamond, and superhardmaterials; isostatic compacting; isostatic hot-pressing; hydrostatic forming of metals; hydraulic cutting;and applications of shock techniques.Written by recognized authorities in industry, government laboratories, and universities, High PressureTechnology is essential reading for the industrial practitioner, high pressure engineer, and researchscientist. In addition, it is a valuable textbook for students in mechanical, chemical, and materialsengineering courses.

This volume provides a practical introduction to the use of high-pressure techniques in chemistry and physics. The authors provide details of the experimental methods and equipment needed to carry out observations and measurements at very high pressures. The pressures involved range from a fewthousand bars for some chemical studies to hundreds of thousands of bars for some physical experimentation.High-pressure techniques may be used to learn more about the structure of matter and mechanisms of chemical reactions. This volume includes detailed descriptions of equipment to measure the following criteria under high pressure conditions: compressibility and equations of state; dielectricconstants and conductance; viscocity; X-ray and neutron diffraction; optical absorption and luminescence; Mossbauer spectra; NMR. IR. and UV spectra; molecular dynamics; kinetics; organic and inorganic synthesis; electro-chemistry and electrophoresis. Applications such as the preservation of foodare also discussed.High-pressure techniques in chemistry and physics: a practical approach is a comprehensive and detailed guide for all those engaged in high-pressure research and a valuable source of information for newcomers to the field. Each chapter contains useful toptics on specific equipment and techniques, aswell as step-by-step protocols, essential background information, and key citations in the literature.

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. Volumes 54 and 55 present contributions by leading researchers in the field of high pressure semiconductors. Edited by T. Suski and W. Paul, these volumes continue the tradition of well-known but outdated publications such as Brigman's The Physics of High Pressure (1931 and 1949) and High Pressure Physics and Chemistry edited by Bradley. Volumes 54 and 55 reflect the industrially important recent developments in research and applications of semiconductor properties and behavior under desirable risk-free conditions at high pressures. These developments include the advent of the diamond anvil cell technique and the availability of commercial piston–cylinder apparatus operating at high hydrostatic pressures. These much-needed books will be useful to both researchers and practitioners in applied physics, materials science, and engineering.