This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

The X-ray standing wave (XSW) technique is an X-ray interferometric method combining diffraction with a multitude of spectroscopic techniques. It is extremely powerful for obtaining information about virtually all properties of surfaces and interfaces on the atomic scale. However, as with any other technique, it has strengths and limitations. The proper use and necessary understanding of this method requires knowledge in quite different fields of physics and technology. This volume presents comprehensively the theoretical background, technical requirements and distinguished experimental highlights of the technique. Containing contributions from the most prominent experts of the technique, such as Andre Authier, Boris Batterman, Michael J Bedzyk, Jene Golovchenko, Victor Kohn, Michail Kovalchuk, Gerhard Materlik and D Phil Woodruff, the book equips scientists with all the necessary information and knowledge to understand and use the XSW technique in practically all applications.

This book concisely illustrates the techniques of major surface analysis and their applications to a few key examples. Surfaces play crucial roles in various interfacial processes, and their electronic/geometric structures rule the physical/chemical properties. In the last several decades, various techniques for surface analysis have been developed in conjunction with advances in optics, electronics, and quantum beams. This book provides a useful resource for a wide range of scientists and engineers from students to professionals in understanding the main points of each technique, such as principles, capabilities and requirements, at a glance. It is a contemporary encyclopedia for selecting the appropriate method depending on the reader's purpose.

Photoelectron spectroscopy is now becoming more and more required to investigate electronic structures of various solid materials in the bulk, on surfaces as well as at buried interfaces. The energy resolution was much improved in the last decade down to 1 meV in the low photon energy region. Now this technique is available from a few eV up to 10 keV by use of lasers, electron cyclotron resonance lamps in addition to synchrotron radiation and X-ray tubes. High resolution angle resolved photoelectron spectroscopy (ARPES) is now widely applied to band mapping of materials. It attracts a wide attention from both fundamental science and material engineering. Studies of the dynamics of excited states are feasible by time of flight spectroscopy with fully utilizing the pulse structures of synchrotron radiation as well as lasers including the free electron lasers (FEL). Spin resolved studies also made dramatic progress by using higher efficiency spin detectors and two dimensional spin detectors. Polarization dependent measurements in the whole photon energy spectrum of the spectra provide useful information on the symmetry of orbitals. The book deals with the fundamental concepts and approaches for the application of this technique to materials studies. Complementary techniques such as inverse photoemission, photoelectron diffraction, photon spectroscopy including infrared and X-ray and scanning tunneling spectroscopy are presented. This book provides not only a wide scope of photoelectron spectroscopy of solids but also extends our understanding of electronic structures beyond photoelectron spectroscopy.

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Revised and expanded second edition of the standard work on new techniques for studying solid surfaces.

APPLICATION OF AMBIENT PRESSURE X-RAY PHOTOELECTRON SPECTROSCOPY TO CATALYSIS Authoritative and detailed reference on ambient-pressure x-ray photoelectron spectroscopy for practitioners and researchers starting in the field Application of Ambient Pressure X-ray Photoelectron Spectroscopy to Catalysis introduces a relatively new analytical method and its applications to chemistry, energy, environmental, and materials sciences, particularly the field of heterogeneous catalysis, covering its background and historical development, its principles, the instrumentation required to use it, analysis of data collected with it, and the challenges it faces. The features of this method are described early in the text; the starting chapters provide a base for understanding how AP-XPS tracks crucial information in terms of the surface of a catalyst during catalysis. The second half of this book delves into the specific applications of AP-XPS to fundamental studies of different catalytic reactions. In later chapters, the focus is on how AP-XPS could provide key information toward understanding catalytic mechanisms. To aid in reader comprehension, the takeaways of each chapter are underlined. In Application of Ambient Pressure X-ray Photoelectron Spectroscopy to Catalysis, readers can expect to find detailed information on specific topics such as: Going from surface of model catalyst in UHV to surface of nanoparticle catalyst during catalysis Application of XPS from surface in UHV to surface in gas or liquid phase and fundamentals of X-ray spectroscopy Significance and challenges of studying surface of a catalyst in gaseous phase and instrumentation of ambient pressure X-ray photoelectron spectrometers Experimental methods of AP-XPS studies and difference in data analysis between AP-XPS and high vacuum XPS Ambient Pressure X-Ray Photoelectron Spectroscopy is an ideal resource for entry level researchers and students involved in x-ray photoelectron spectroscopy. Additionally, the text will appeal to scientists in more senior roles in academic and government laboratory institutions in the fields of chemistry, chemical engineering, energy science, and materials science.

Metal Oxide Nanoparticles A complete nanoparticle resource for chemists and industry professionals Metal oxide nanoparticles are integral to a wide range of natural and technological processes—from mineral transformation to electronics. Additionally, the fields of engineering, electronics, energy technology, and electronics all utilize metal oxide nanoparticle powders. Metal Oxide Nanoparticles: Formation, Functional Properties, and Interfaces presents readers with the most relevant synthesis and formulation approaches for using metal oxide nanoparticles as functional materials. It covers common processing routes and the assessment of physical and chemical particle properties through comprehensive and complementary characterization methods. This book will serve as an introduction to nanoparticle formulation, their interface chemistry and functional properties at the nanoscale. It will also act as an in-depth resource, sharing detailed information on advanced approaches to the physical, chemical, surface, and interface characterization of metal oxide nanoparticle powders and dispersions. Addresses the application of metal oxide nanoparticles and its economic impact Examines particle synthesis, including the principles of selected bottom-up strategies Explores nanoparticle formulation—a selection of processing and application routes Discusses the significance of particle surfaces and interfaces on structure formation, stability and functional materials properties Covers metal oxide nanoparticle characterization at different length scales With this valuable resource, academic researchers, industrial chemists, and PhD students can all gain insight into the synthesis, properties, and applications of metal oxide nanoparticles.

Functional oxides have a wide variety of applications in the electronic industry. The discovery of new metal oxides with interesting and useful properties continues to drive much research in chemistry, physics, and materials science. In Functional Oxides five topical areas have been selected to illustrate the importance of metal oxides in modern materials chemistry: Noncentrosymmetric Inorganic Oxide Materials Geometrically Frustrated Magnetic Materials Lithium Ion Conduction in Oxides Thermoelectric Oxides Transition Metal Oxides - Magnetoresistance and Half-Metallicity The contents highlight structural chemistry, magnetic and electronic properties, ionic conduction and other emerging areas of importance, such as thermoelectricity and spintronics. Functional Oxides covers these complex concepts in a clear and accessible manner providing an excellent introduction to this broad subject area.