Market: Students and researchers in space and high-vacuum technology and materials science. This handbook was originally prepared so that workers would not have to consult a great many sources to learn what procedures and materials were used to construct tubes and other evacuated devices. Even now, as space and high-vacuum research are yielding new information daily, much of the subject matter in this seminal work, such as properties of materials, are as cogent as they were in 1964 when the book was first published.

This comprehensive, standard work has been updated to remain an important resource for all those needing detailed knowledge of the theory and applications of vacuum technology. The text covers the existing knowledge on all aspects of vacuum science and technology, ranging from fundamentals to components and operating systems. It features many numerical examples and illustrations to help visualize the theoretical issues, while the chapters are carefully cross-linked and coherent symbols and notations are used throughout the book. The whole is rounded off by a user-friendly appendix of conversion tables, mathematical tools, material related data, overviews of processes and techniques, equipment-related data, national and international standards, guidelines, and much more. As a result, engineers, technicians, and scientists will be able to develop and work successfully with the equipment and environment found in a vacuum.

In the decade and a half since the publication of the Second Edition of A User?s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today?s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User?s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.

A USERS GUIDE TO VACUUM TECHNOLOGY Choose and understand the vacuum technology that fits your project’s needs with this indispensable guide Vacuum technology is used to provide process environments for other kinds of engineering technology, making it an unsung cornerstone of hundreds of projects incorporating analysis, research and development, manufacturing, and more. Since it is very often a secondary technology, users primarily interested in processes incorporating it will frequently only encounter vacuum technology when purchasing or troubleshooting. There is an urgent need for a guide to vacuum technology made with these users in mind. For decades, A User’s Guide to Vacuum Technology has met this need, with a user-focused introduction to vacuum technology as it is incorporated into semiconductor, optics, solar sell, and other engineering processes. With an emphasis on otherwise neglected subjects and on accessibility to the secondary user of vacuum technology, it balances treatment of older systems that are still in use with a survey of the latest cutting-edge technologies. The result promises to continue as the essential guide to vacuum systems. Readers of the fourth edition of A User’s Guide to Vacuum Technology will also find: Expanded treatment of gauges, pumps, materials, systems, and best??operating practices Detailed discussion of cutting-edge topics like ultraclean vacuum and contamination control An authorial team with decades of combined research and engineering experience A User’s Guide to Vacuum Technology is essential for those entering emerging STEM programs, engineering professionals and graduate students working with a huge range of engineering technologies.

Vacuum plays an important role in science and technology. The study of interaction of charged particles, neutrals and radiation with each other and with solid surfaces requires a vacuum environment for reliable investigations. Vacuum has contributed to major advancements made in nuclear science, space, metallurgy, electrical/electronic technology, chemical engineering, transportation, robotics and many other fields. This book is intended to assist students, scientists, technicians and engineers with understanding the basics of vacuum science and technology for application in their projects. The fundamental theories, concepts, devices, applications, and key inventions are discussed.

The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Issues for 1929- include section Contents noted (1929-1939 called Metallurgical abstracts; Jan. 1940- Sept. 1945 called Engineering digest; Oct. 1945- called Materials & methods digest) Annual indexes of the abstracts and digest were prepared 1929-1941; beginning in 1942, included in the complete index to the periodical.