Developments in Surface Contamination and Cleaning: Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants, Volume Twelve, the latest release in the Developments in Surface Contamination and Cleaning series, provides best practices on determining surface cleanliness. Chapters include an introduction to the nature and size of particles, a discussion of cleanliness levels, detailed coverage of measurement methods, characterization methods and analytical methods for evaluating surfaces, and an overview of analysis methods for various contaminants. As a whole, the series creates a unique and comprehensive knowledge base for those in research and development in a variety of industries. Manufacturing, quality control and procurement specification professionals in the aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography industries will find this book to be very helpful. In addition, researchers in an academic setting will also find these volumes excellent source books. - Includes an extensive listing, with a description of available methods for the assessment of surface cleanliness - Provides a single source of information on methods for verification of surface cleanliness - Serves as a guide to the selection, assessment and verification of methods for specific applications

Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.• Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical.• A single source document addressing everything from the sources of contamination to their removal and prevention.• Amply referenced and profusely illustrated.

As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. - Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field - Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries - Serves as a guide to the selection of precision cleaning techniques for specific applications

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area.Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. - Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination - Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others - Covers novel wet and dry surface cleaning methods of increasing commercial importance

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: - A systems analysis approach to contamination control - Physical factors that influence the behavior of particle deposition in enclosures - An overview of current yield models and description of advanced models - Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants - In-depth coverage of ultrasonic cleaning - Contamination and cleaning issues at the nanoscale - Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

With increasing demand for hygienic, self-disinfecting and contamination free surfaces, interest in developing self-cleaning protective materials and surfaces has grown rapidly in recent times. This new title comprises of invited chapters from renowned researchers in the area of self-cleaning nano-coatings and the result is a comprehensive review of current research on both hydrophobic and hydrophilic (photocatalytic effect) self-cleaning materials.

Microbial Contamination and Food Degradation, Volume 10 in the Handbook of Food Bioengineering series, provides an understanding of the most common microbial agents involved in food contamination and spoilage, and highlights the main detection techniques to help pinpoint the cause of contamination. Microorganisms may cause health-threatening conditions directly by being ingested together with contaminated food, or indirectly by producing harmful toxins and factors that can cause food borne illness. This resource discusses the potential sources of contamination, the latest advances in contamination research and strategies to prevent contamination using key methods of analysis and evaluation. - Presents modern alternatives for avoiding microbial spoilage and food degradation using preventative and intervention technologies - Provides key methods for addressing microbial contamination and preventing food borne illness through research and risk assessment analysis - Includes detailed information on bacterial contamination problems in different environmental environments and the methodologies to help solve those problems

The present volume and its companion Volume 2 document the proceedings of the Symposium on Surface Contamination: Its Genesis, Detection and Control held in Washington, D.C., September 10-13, 1978. This Symposium was a part of the 4th International Symposium on Contamination Control held under the auspices of the International Committee of Contamination Control Societies, and the Institute of Environmental Sciences (U.S.A.) was the official host. The ubiquitous nature of surface contamination causes concern to everyone dealing with surfaces, and the world of surfaces is wide and open-ended. The technological areas where surface clean ing is of cardinal importance are too many and very diversified. To people working in areas such as adhesion, composites, adsorp tion, friction, lubrication, soldering,device fabrication, printed circuit boards, etc., surface contamination has always been a bete noire. In short, people dealing with surfaces are afflicted with molysmophobiat, and rightfully so. In the past, the subject of surface contamination had been discussed in various meetings, but this symposium was hailed as the most comprehensive symposium ever held on this important topic, as the technical program comprised 70 papers by more than 100 authors from 10 countries. The symposium was truly international in scope and spirits and was very well attended. The attendees represented a broad spectrum of backgrounds, interests, and pro fessional affiliations, but all had a common interest and concern about surface contamination and cleaning.