In this work Atomic Layer deposition of niobium and titanium doped ZnO based Transparent Conductive Oxide (TCO) coatings were developed. The fundamentals required for the deposition and doping of ZnO TCOs are discussed. The various opto-electronic properties of the niobium and titanium doped ZnO films were determined and compared. A model was proposed to explain the various changes in the opto-electronic properties of these films.

Zinc oxide (ZnO) belongs to the class of transparent conducting oxides that can be used as transparent electrodes in electronic devices or heated windows. In this book the material properties of, the deposition technologies for, and applications of zinc oxide in thin film solar cells are described in a comprehensive manner. Structural, morphological, optical and electronic properties of ZnO are treated in this review.

Zinc oxide (ZnO) belongs to the class of transparent conducting oxides that can be used as transparent electrodes in electronic devices or heated windows. In this book the material properties of, the deposition technologies for, and applications of zinc oxide in thin film solar cells are described in a comprehensive manner. Structural, morphological, optical and electronic properties of ZnO are treated in this review.

Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Edited by well-known pioneers in the field, this handbook and ready reference provides a comprehensive overview of transparent conductive materials with a strong application focus. Following an introduction to the materials and recent developments, subsequent chapters discuss the synthesis and characterization as well as the deposition techniques that are commonly used for energy harvesting and light emitting applications. Finally, the book concludes with a look at future technological advances. All-encompassing and up-to-date, this interdisciplinary text runs the gamut from chemistry and materials science to engineering, from academia to industry, and from fundamental challenges to readily available applications.

Atom Probe Tomography is aimed at beginners and researchers interested in expanding their expertise in this area. It provides the theoretical background and practical information necessary to investigate how materials work using atom probe microscopy techniques, and includes detailed explanations of the fundamentals, the instrumentation, contemporary specimen preparation techniques, and experimental details, as well as an overview of the results that can be obtained. The book emphasizes processes for assessing data quality and the proper implementation of advanced data mining algorithms. For those more experienced in the technique, this book will serve as a single comprehensive source of indispensable reference information, tables, and techniques. Both beginner and expert will value the way the book is set out in the context of materials science and engineering. In addition, its references to key research outcomes based upon the training program held at the University of Rouen—one of the leading scientific research centers exploring the various aspects of the instrument—will further enhance understanding and the learning process. - Provides an introduction to the capabilities and limitations of atom probe tomography when analyzing materials - Written for both experienced researchers and new users - Includes exercises, along with corrections, for users to practice the techniques discussed - Contains coverage of more advanced and less widespread techniques, such as correlative APT and STEM microscopy

Consumer-driven demand for affordable, smaller and more sophisticated devices has driven advances in nanoscale engineering. Many of these products, whether they are consumer electronics, fuel cells or photovoltaics, are comprised of significant quantities of scarce, expensive and sometimes toxic materials. Manufacturing affordable and more environmentally benign products on decreasing length scales requires more economical use of scarce resources and the exploration of alternative and abundant materials. Platinum, as one example, is an outstanding catalyst used in automotive, fine chemical and fuel cell applications; however, it is extremely scarce and costly. Placing platinum only where needed and in small quantities to achieve desired performance may help economize its usage. Because nanoscale feature size and spacing influence catalytic behavior, being able to control these parameters may enable the careful engineering of more powerful platinum catalysts. Another scarce and expensive material whose usage follows rising consumer demand for electronics and photovoltaics is indium. Indium tin oxide is the industry standard transparent conducting oxide (TCO) for high-end electronics. The engineering of high-quality yet poorly-understood indium-free alternative metal oxides using earth-abundant and inexpensive materials may further the development of more powerful and advanced devices. In this dissertation, atomic layer deposition (ALD), a promising ultra-thin film growth technique, is used to selectively deposit small amounts of platinum and to alloy zinc tin oxide in order to address these concerns of scarcity and rising costs. ALD consists of self-limiting, gas-surface half-reactions separated by inert gas purges which allows for highly controlled growth of nanoscale materials. Because ALD is based on surface reactions, selectively blocking nucleation sites by passivating growth surfaces allows for the deposition of material only where desired. The spatial deposition of platinum using ALD is demonstrated in two studies. In the first, a water-soluble polymer, polymethacrylamide (PMAM) acts as a resist to ALD and allowed the deposition of very small features of platinum. In the second study, surface passivation by means of controlling defect site density in self-assembled monolayers (SAMs) also serves as a growth template to control the aerial density and size of platinum nanoparticles deposited via ALD. The highly tunable nature of the chemistry of each precursor half-reaction in ALD enables the careful alloying or doping of materials in any desired ratio. A range of compositions for the indium-free TCO alternative, zinc tin oxide (ZTO), is explored by varying the dosing cycle ratios of tin oxide (SnOx) and zinc oxide (ZnO) in each ALD super cycle. Because the effects of ZTO composition on conduction behavior and optical properties are not well understood, having nanoscale control over how the constituent metal oxides grow on one another is an effective approach to learning more about these properties. As a result, ALD is explored as a flexible system to allow for compositional sampling and variation of film lamination in ZTO. The characteristics of ZTO ALD and the structural and optical properties of these films were shown to vary significantly as a function of degree of lamination and composition. These findings suggest that having nanoscale control over these film characteristics via ALD can lead to further understanding of ZTO. The ALD of ZTO provides an excellent system for the nanoengineering of this material as an indium-free TCO or buffer layer in solar cells.