In recent years, utilization of the abundant advantages of quantum physics, quantum dots, quantum wires, quantum wells, and nanocrystals has attracted considerable scientific attention in the field of nonvolatile memory. Nanocrystals are the driving element that have brought the nonvolatile flash memory technology to a distinguished height. However, new approaches are still required to strengthen this technology for future applications. This book details the methods of fabrication of nanocrystals and their application in baseline nonvolatile memory and emerging nonvolatile memory technologies. The chapters have been written by renowned experts of the field and will provide an in-depth understanding of these technologies. The book is a valuable tool for research and development sectors associated with electronics, semiconductors, nanotechnology, material sciences, solid state memories, and electronic devices.

In recent years, the abundant advantages of quantum physics, quantum dots, quantum wires, quantum wells, and nanocrystals in various applications have attracted considerable scientific attention in the field of nonvolatile memory (NVM). Nanocrystals are the driving elements that have helped nonvolatile flash memory technology reach its distinguished height, but new approaches are still needed to strengthen nanocrystal-based nonvolatile technology for future applications. This book presents comprehensive knowledge on nanocrystal fabrication methods and applications of nanocrystals in baseline NVM and emerging NVM technologies and the chapters are written by experts in the field from all over the globe. The book presents a detailed analysis on nanocrystal-based emerging devices by a high-level researcher in the field. It has a unique chapter especially dedicated to graphene-based flash memory devices, considering the importance of carbon allotropes in future applications. This updated edition covers emerging ferroelectric memory device, which is a technology for the future, and the chapter is contributed by the well-known Ferroelectric Memory Company, Germany. It includes information related to the applications of emerging memories in sensors and the chapter is contributed by Ajou University, South Korea. The book introduces a new chapter for emerging NVM technology in artificial intelligence and the chapter is contributed by University College London, UK. It guides the readers throughout with appropriate illustrations, excellent figures, and references in each chapter. It is a valuable tool for researchers and developers from the fields of electronics, semiconductors, nanotechnology, materials science, and solid-state memories.

Semiconductor flash memory is an indispensable component of modern electronic systems which has gained a strategic position in recent decades due to the progressive shift from computing to consumer (and particularly mobile) products as revenue drivers for Integrated Circuits (IC) companies. This book provides a comprehensive overview of the different technological approaches currently being studied to fulfill future memory requirements. Two main research paths are identified and discussed. Different "evolutionary paths" based on the use of new materials (such as silicon nanocrystals for storage nodes and high-k insulators for active dielectrics) and of new transistor structures (such as multi-gate devices) are investigated in order to extend classical floating gate technology to the 32 nm node. "Disruptive paths" based on new storage mechanisms or new technologies (such as phase-change devices, polymer or molecular cross-bar memories) are also covered in order to address 22 nm and smaller IC generations. Finally, the main factors at the origin of these phenomena are identified and analyzed, providing pointers on future research activities and developments in this area.

Providing cutting-edge research on nanoelectronics and photonic devices and its application in future integrated circuits, this state-of-the-art book tackles the challenges of the different detailed theoretical and analytical models of solving the problems of various nanodevices. The volume also explores from different angles the roles of material composition and choice of materials that now play the most critical role in determining outcomes of low-dimensional nanoelectronic devices. The applications of those findings are extremely beneficial for the computing and telecommunication industries. Beginning with a solid theoretical background for every chapter, this volume covers the hottest areas of present-day electronic engineering. The continuous miniaturization of devices, components, and systems requires corresponding cutting-edge theoretical analysis supported by simulated findings before actual fabrication. That purpose is given maximum focus in this volume, which has interdisciplinary appeal, making it a comprehensive technological volume that deals with underlying aspects of physics, materials, structures in nano-regime, and the corresponding end-product in the form of devices.

This Proceedings of APCRE'05 contains the articles that were presented at the 4th Asia-Pacific Chemical Reaction Engineering Symposium (APCRE'05), held at Gyeongju, Korea between June 12 and June 15, 2005, with a theme of "New Opportunities of Chemical Reaction Engineering in Asia-Pacific Region". Following the tradition of APCRE Symposia and ISCRE, the scientific program encompassed a wide spectrum of topics, including not only the traditional areas but also the emerging fields of chemical reaction engineering into which the chemical reaction engineers have successfully spearheaded and made significant contributions in recent years. In addition to the 190 papers being accepted, six plenary lectures and 11 invited lectures are placed in two separate chapters in the front.* Provides an overview of new developments and application in chemical reaction engineering* Topics include traditional and emerging fields * Papers reviewed by experts in the field

Metal Oxides for Non-volatile Memory: Materials, Technology and Applications covers the technology and applications of metal oxides (MOx) in non-volatile memory (NVM) technology. The book addresses all types of NVMs, including floating-gate memories, 3-D memories, charge-trapping memories, quantum-dot memories, resistance switching memories and memristors, Mott memories and transparent memories. Applications of MOx in DRAM technology where they play a crucial role to the DRAM evolution are also addressed. The book offers a broad scope, encompassing discussions of materials properties, deposition methods, design and fabrication, and circuit and system level applications of metal oxides to non-volatile memory. Finally, the book addresses one of the most promising materials that may lead to a solution to the challenges in chip size and capacity for memory technologies, particular for mobile applications and embedded systems. - Systematically covers metal oxides materials and their properties with memory technology applications, including floating-gate memory, 3-D memory, memristors, and much more - Provides an overview on the most relevant deposition methods, including sputtering, CVD, ALD and MBE - Discusses the design and fabrication of metal oxides for wide breadth of non-volatile memory applications from 3-D flash technology, transparent memory and DRAM technology

Below the 65nm technology node, the present Flash memory technology is facing daunting scaling challenges. Smart and heterogeneous integration of materials throughout the entire device structure is required to facilitate the feature-size scaling without compromising the memory performance. The metal nanocrystal (NC) memory is promising for realizing high-density nonvolatile storage, while providing unique advantages on low-voltage operation and superior cycling lifetime. We present in this work a combined experimental and modeling study on the metal NC memory. A physical model based on the three-dimensional (3D) electrostatics and the one-dimensional (1D) Wentzel-Kramers-Brillouin (WKB) tunneling current calculation is established. The optimization strategies including NC array, gate dielectrics, and charge storage nodes are further detailed to achieve efficient program/erase (P/E) at +/-4V. Beyond the metal NC memory, in the efforts of realizing hybrid molecular/Si electronics, we show programmable and quantized redox states of C60 molecules in a nonvolatile memory cell at room-temperature. C60 may also be employed as a double-junction resonant tunnel barrier in nonvolatile memories with improved tunneling asymmetry between P/E and retention.

Rising consumer demand for low power consumption electronics has generated a need for scalable and reliable memory devices with low power consumption. At present, scaling memory devices and lowering their power consumption is becoming more difficult due to unresolved challenges, such as short channel effect, Drain Induced Barrier Lowering (DIBL), and sub-surface punch-through effect, all of which cause high leakage currents. As a result, the introduction of different memory architectures or materials is crucial. Nanomaterials-based Charge Trapping Memory Devices provides a detailed explanation of memory device operation and an in-depth analysis of the requirements of future scalable and low powered memory devices in terms of new materials properties. The book presents techniques to fabricate nanomaterials with the desired properties. Finally, the book highlights the effect of incorporating such nanomaterials in memory devices. This book is an important reference for materials scientists and engineers, who are looking to develop low-powered solutions to meet the growing demand for consumer electronic products and devices. - Explores in depth memory device operation, requirements and challenges - Presents fabrication methods and characterization results of new nanomaterials using techniques, including laser ablation of nanoparticles, ALD growth of nano-islands, and agglomeration-based technique of nanoparticles - Demonstrates how nanomaterials affect the performance of memory devices