Adsorption on Ordered Surfaces of Ionic Solids and Thin Films introduces to a new and topical field of surface science for which rather little experience is available at present. It reviews the recent results of the employed analytical methods comprising all modern surface techniques including scanning tunneling microscopy and various kinds of electron spectroscopies. The present status of this new, clearly defined field of surface science is nearly completely overviewed by contributions from most of the research groups active in this field. The book is meant as a basis for the expected rapid development in this area with applications in catalysis, thin-film and semiconductor technology, sensors, electrochemistry, controlled preparation of ultrathin epitaxial surfaces, and interfaces of insultors as well as future molecular electronics.

Heterogeneous catalysis provides the backbone of the world's chemical and oil industries. The innate complexity of practical catalytic systems suggests that useful progress should be achievable by investigating key aspects of catalysis by experimental studies on idealised model systems. Thin films and supported clusters are two promising types of model system that can be used for this purpose, since they mimic important aspects of the properties of practical dispersed catalysts. Similarly, appropriate theoretical studies of chemisorption and surface reaction clusters or extended slab systems can provide valuable information on the factors that underlie bonding and catalytic activity. This volume describes such experimental and theoretical approaches to the surface chemistry and catalytic behaviour of metals, metal oxides and metal/metal oxide systems. An introduction to the principles and main themes of heterogeneous catalysis is followed by detailed accounts of the application of modern experimental and theoretical techniques to fundamental problems. The application of advanced experimental methods is complemented by a full description of theoretical procedures, including Hartree-Fock, density functional and similar techniques. The relative merits of the various approaches are considered and directions for future progress are indicated.

Interface and colloid science is an important, though often under-valued, branch of science. It has applications and ramifications in domains as disparate as agriculture, mineral dressing, oil recovery, chemical industry, biotechnology, medical science, and many more. Proper application of interface and colloid science requires factual knowledge and insight into the many basic laws of physics and chemistry upon which it is based. Fundamentals of Interface and Colloid Science is the first book to cover this field in the depth neccessary to be a valuable reference and an excellent textbook.From the beginning to the end of the book, systems of growing complexity are treated gradually. The presentation is particularly suited to emphasize that interfaces are not autonomous phases. As a rule, interfacial properties can be varied only by changing the adjoining phases, so that the properties of these bulk phases must be understood first. The text also recognizes common principles behind a variety of phenomena, and helps the reader to understand them and to develop and improve processes. The systematic treatment of the material in the book makes this clear, and makes the text itself an important contribution to the field. - Systematic treatment of information - An excellent addition to volume I - Two chapters contributed by other experts in the field - Uses a deductive approach to increase the order of complexity - Written by a leading expert in the field - Two chapters contributed by other outstanding scientists - Uses a systematic and deductive approach - First comprehensive review of the topic

Semiconductor Surfaces and Interfaces deals with structural and electronic properties of semiconductor surfaces and interfaces. The first part introduces the general aspects of space-charge layers, of clean-surface and adatom-included surfaces states, and of interface states. It is followed by a presentation of experimental results on clean and adatom-covered surfaces which are explained in terms of simple physical and chemical concepts and models. Where available, results of more refined calculations are considered. A final chapter is devoted to the band lineup at semiconductor interfaces.

This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.

This is one of the first application-orientated books on the subject. The main topics are magnetic sensors with high resolutions and magnetic read heads with high sensitivities, required for hard-disk drives with recording densities of several gigabytes. Another important subject is novel magnetic random-access memory (MRAM) with non-volatile non-destructive and radiation-hard characteristics.

Modern technologies increasingly rely on low-dimensional physics at interfaces and in thin-films and nano-structures. Surface science holds a key position in providing the experimental methods and theoretical models for a basic understanding of these effects. This book includes case studies and status reports about research topics such as: surface structure determination by tensor-LEED and surface X-ray diffraction; the preparation and detection of low-dimensional electronic surface states; quantitative surface compositional analysis; the dynamics of adsorption and reaction of adsorbates, e.g. kinetic oscillations; the characterization and control of thin-film and multilayer growth including the influence of surfactants; a critical assessment of the surface physics approach to heterogeneous catalysis.

This field has now matured from being an exotic experimental field into a well-established area of science. The spectroscopy of molecules and molecular adsorbates on surfaces is one area of science where synchrotron-radiation-related studies had made an impact on understanding the ground-state properties as well as the dynamics. With the new high-brightness synchrotron-radiation sources ahead, this will certainly continue to be a field of very active research.

Heteroepitaxial films are commonplace among today's electronic and photonic devices. The realization of new and better devices relies on the refinement of epitaxial techniques and improved understanding of the physics underlying epitaxial growth. This book provides an up-to-date report on a wide range of materials systems. The first half reviews metallic and dielectric thin films, including chapters on metals, rare earths, metal-oxide layers, fluorides, and high-c superconductors. The second half covers semiconductor systems, reviewing developments in group-IV, arsenide, phosphide, antimonide, nitride, II-VI and IV-VI heteroepitaxy. Topics important to several systems are covered in chapters on atomic processes, ordering and growth dynamics.