A one-stop, concise guide on determining and measuring thin film thickness by optical methods. This practical book covers the laws of electromagnetic radiation and interaction of light with matter, as well as the theory and practice of thickness measurement, and modern applications. In so doing, it shows the capabilities and opportunities of optical thickness determination and discusses the strengths and weaknesses of measurement devices along with their evaluation methods. Following an introduction to the topic, Chapter 2 presents the basics of the propagation of light and other electromagnetic radiation in space and matter. The main topic of this book, the determination of the thickness of a layer in a layer stack by measuring the spectral reflectance or transmittance, is treated in the following three chapters. The color of thin layers is discussed in chapter 6. Finally, in chapter 7, the author discusses several industrial applications of the layer thickness measurement, including high-reflection and anti-reflection coatings, photolithographic structuring of semiconductors, silicon on insulator, transparent conductive films, oxides and polymers, thin film photovoltaics, and heavily doped silicon. Aimed at industrial and academic researchers, engineers, developers and manufacturers involved in all areas of optical layer and thin optical film measurement and metrology, process control, real-time monitoring, and applications.

This book offers a genuinely practical introduction to the most commonly encountered optical and non-optical systems used for the metrology and characterization of surfaces, including guidance on best practice, calibration, advantages and disadvantages, and interpretation of results. It enables the user to select the best approach in a given context. Most methods in surface metrology are based upon the interaction of light or electromagnetic radiation (UV, NIR, IR), and different optical effects are utilized to get a certain optical response from the surface; some of them record only the intensity reflected or scattered by the surface, others use interference of EM waves to obtain a characteristic response from the surface. The book covers techniques ranging from microscopy (including confocal, SNOM and digital holographic microscopy) through interferometry (including white light, multi-wavelength, grazing incidence and shearing) to spectral reflectometry and ellipsometry. The non-optical methods comprise tactile methods (stylus tip, AFM) as well as capacitive and inductive methods (capacitive sensors, eddy current sensors). The book provides: Overview of the working principles Description of advantages and disadvantages Currently achievable numbers for resolutions, repeatability, and reproducibility Examples of real-world applications A final chapter discusses examples where the combination of different surface metrology techniques in a multi-sensor system can reasonably contribute to a better understanding of surface properties as well as a faster characterization of surfaces in industrial applications. The book is aimed at scientists and engineers who use such methods for the measurement and characterization of surfaces across a wide range of fields and industries, including electronics, energy, automotive and medical engineering.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Emphasis is placed on practicability of the various approaches. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics. The book is written by international top experts, all of whom are involved in industrial research and development projects.

The International System of Units (SI) is the world's most widely used system of measurement, used every day in commerce and science, and is the modern form of the metric system. It currently comprises the meter (m), the kilogram (kg), the second (s), the ampere (A), the kelvin (K), the candela (cd) and the mole (mol)). The system is changing though, units and unit definitions are modified through international agreements as the technology of measurement progresses, and as the precision of measurements improves. The SI is now being redefined based on constants of nature and their realization by quantum standards. Therefore, the underlying physics and technologies will receive increasing interest, and not only in the metrology community but in all fields of science. This book introduces and explains the applications of modern physics concepts to metrology, the science and the applications of measurements. A special focus is made on the use of quantum standards for the realization of the forthcoming new SI (the international system of units). The basic physical phenomena are introduced on a level which provides comprehensive information for the experienced reader but also provides a guide for a more intense study of these phenomena for students.

Controlling the properties of materials by modifying their composition and by manipulating the arrangement of atoms and molecules is a dream that can be achieved by nanotechnology. As one of the fastest developing and innovative -- as well as well-funded -- fields in science, nanotechnology has already significantly changed the research landscape in chemistry, materials science, and physics, with numerous applications in consumer products, such as sunscreens and water-repellent clothes. It is also thanks to this multidisciplinary field that flat panel displays, highly efficient solar cells, and new biological imaging techniques have become reality. This second, enlarged edition has been fully updated to address the rapid progress made within this field in recent years. Internationally recognized experts provide comprehensive, first-hand information, resulting in an overview of the entire nano-micro world. In so doing, they cover aspects of funding and commercialization, the manufacture and future applications of nanomaterials, the fundamentals of nanostructures leading to macroscale objects as well as the ongoing miniaturization toward the nanoscale domain. Along the way, the authors explain the effects occurring at the nanoscale and the nanotechnological characterization techniques. An additional topic on the role of nanotechnology in energy and mobility covers the challenge of developing materials and devices, such as electrodes and membrane materials for fuel cells and catalysts for sustainable transportation. Also new to this edition are the latest figures for funding, investments, and commercialization prospects, as well as recent research programs and organizations.

Controlling the properties of materials by modifying their composition and by manipulating the arrangement of atoms and molecules is a dream that can be achieved by nanotechnology. As one of the fastest developing and innovative -- as well as well-funded -- fields in science, nanotechnology has already significantly changed the research landscape in chemistry, materials science, and physics, with numerous applications in consumer products, such as sunscreens and water-repellent clothes. It is also thanks to this multidisciplinary field that flat panel displays, highly efficient solar cells, and new biological imaging techniques have become reality. This second, enlarged edition has been fully updated to address the rapid progress made within this field in recent years. Internationally recognized experts provide comprehensive, first-hand information, resulting in an overview of the entire nano-micro world. In so doing, they cover aspects of funding and commercialization, the manufacture and future applications of nanomaterials, the fundamentals of nanostructures leading to macroscale objects as well as the ongoing miniaturization toward the nanoscale domain. Along the way, the authors explain the effects occurring at the nanoscale and the nanotechnological characterization techniques. An additional topic on the role of nanotechnology in energy and mobility covers the challenge of developing materials and devices, such as electrodes and membrane materials for fuel cells and catalysts for sustainable transportation. Also new to this edition are the latest figures for funding, investments, and commercialization prospects, as well as recent research programs and organizations.

Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.

Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

A new generation of MEMS books has emerged with this cohesive guide on the design and analysis of micro-electro-mechanical systems (MEMS). Leading experts contribute to its eighteen chapters that encompass a wide range of innovative and varied applications. This publication goes beyond fabrication techniques covered by earlier books and fills a void created by a lack of industry standards. Subjects such as transducer operations and free-space microsystems are contained in its chapters. Satisfying a demand for literature on analysis and design of microsystems the book deals with a broad array of industrial applications. This will interest engineering and research scientists in industry and academia.

21 years ago it was a joint idea with Hans Rottenkolber to organize a workshop dedicated to the discussion of the latest results in the automatic processing of fringe patterns. This idea was promoted by the insight that automatic and high precision phase measurement techniques will play a key role in all future industrial and scientific applications of optical metrology. A couple of months later more than 50 specialists from East and West met in East Berlin, the capital of the former GDR, to spend 3 days with the discussion of new principles of fringe processing. In the stimulating atmoshere the idea was born to repeat the workshop and to organize the meeting in an olympic schedule. And thus meanwhile 20 years have been passed and we have today Fringe number six. However, such a workshop takes place in a dynamic environment. Therefore the main topics of the previous events were always adapted to the most interesting subjects of the new period. In 1993 the workshop took place in Bremen and was dedicated to new principles of optical shape measurement, setup calibration, phase unwrapping and nondestructive testing, while in 1997 new approaches in multi-sensor metrology, active measurement strategies and hybrid processing technologies played a central role. 2001, the first meeting in the 21st century, was focused to optical methods for micromeasurements, hybrid measurement technologies and new sensor solutions for industrial inspection.