Written by a distinguished plasma scientist and experienced author, this up-to-date work comprehensively covers current methods and new developments and techniques, including non-equilibrium atomic and molecular plasma states, as well as such new applications as gas lasers. Containing numerous appendices with reference data indispensable for plasma spectroscopy, such as statistical weights and partition sums and diatomic molecules. For plasmaphysicists, spectroscopists, materials scientists and physical chemists. Appendix H is only available online.

Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.

Although based on lectures given for graduate students and postgraduates starting in plasma physics, this concise introduction to the fundamental processes and tools is as well directed at established researchers who are newcomers to spectroscopy and seek quick access to the diagnostics of plasmas ranging from low- to high-density technical systems at low temperatures, as well as from low- to high-density hot plasmas. Basic ideas and fundamental concepts are introduced as well as typical instrumentation from the X-ray to the infrared spectral regions. Examples, techniques and methods illustrate the possibilities. This book directly addresses the experimentalist who actually has to carry out the experiments and their interpretation. For that reason about half of the book is devoted to experimental problems, the instrumentation, components, detectors and calibration.

With its strong focus on the links between theory and experiment or technological process, this book presents the latest advances in our understanding of how plasmas behave. New contributions to this second edition cover dusty plasmas, cross-correlation spectroscopy, atmospheric pressure glow discharges, as well as applications in lightening, microelectronics, polymer surface modification, sterilization, biology and medicine. Straddling the boundaries between physics, chemistry and materials science, this is of interest to a wide community. From reviews of the first edition: "... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field." ChemPhysChem

This is a comprehensive textbook designed for graduate and advanced undergraduate students. Both authors rely on more than 20 years of teaching experience in renowned Physics Engineering courses to write this book addressing the students’ needs. Kinetics and Spectroscopy of Low Temperature Plasmas derives in a full self-consistent way the electron kinetic theory used to describe low temperature plasmas created in the laboratory with an electrical discharge, and presents the main optical spectroscopic diagnostics used to characterize such plasmas. The chapters with the theoretical contents make use of a deductive approach in which the electron kinetic theory applied to plasmas with basis on the electron Boltzmann equation is derived from the basic concepts of Statistical and Plasma Physics. On the other hand, the main optical spectroscopy diagnostics used to characterize experimentally such plasmas are presented and justified from the point of view of the Atomic and Molecular Physics. Low temperature plasmas (LTP) are partially ionized gases with a broad use in many technological applications such as microelectronics, light sources, lasers, biology and medicine. LTPs lead to the production of atomic and molecular excited states, chemically reactive radicals, and activated surface sites, which are in the origin, among others, of the deposition of thin films, advanced nanotechnology products, solar cells, highly efficient combustion motors, and treatment of cancer cells.

Low temperature plasma in medicine is a new field that rose from the research in the application of cold plasmas in bioengineering. Plasma medicine is an innovative and promising multidisciplinary novel field of research covering plasma physics, life sciences, and clinical medicine to apply physical plasma for therapeutic applications. Emerging Developments and Applications of Low Temperature Plasma explores all areas of experimental, computational, and theoretical study of low temperature and atmospheric plasmas and provides a collection of exciting new research on the fundamental aspects of low temperature and pressure plasmas and their applications. Covering topics such as carbon nanotubes, foodborne pathogens, and plasma formation, this book is an essential resource for research groups, plasma-based industries, plasma aerodynamics industries, metal and cutlery industries, medical institutions, researchers, and academicians.

This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.

Cold atmospheric plasma (CAP) emerges as a possible new modality for cancer treatment. This book provides a comprehensive introduction into fundamentals of the CAP and plasma devices used in plasma medicine. An analysis of the mechanisms of plasma interaction with cancer and normal cells including description of possible mechanisms of plasma selectivity is included. Recent advances in the field, the primary challenges and future directions are presented.

This is a comprehensive description of the theoretical foundations and experimental applications of spectroscopic methods in plasma physics research. It introduces the classical and quantum theory of radiation, with detailed descriptions of line strengths and high density effects, and describes theoretical and experimental aspects of spectral line broadening. The book illustrates the concepts of continuous spectra, level kinetics and cross sections, thermodynamic equilibrium relations, radiative energy transfer, and radiative energy losses. The basics of plasma spectroscopy to density and temperature measurements and to the determination of some other plasma properties are also explored. Over one thousand references not only guide the reader to original research covered in the chapters, but also to experimental details and instrumentation.

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.