Proceedings Of The Second International Symposium On Ultra Clean Processing Of Silicon Surfaces
Download Proceedings Of The Second International Symposium On Ultra Clean Processing Of Silicon Surfaces full books in PDF, epub, and Kindle. Read online free Proceedings Of The Second International Symposium On Ultra Clean Processing Of Silicon Surfaces ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads.
Author |
: Marc Heyns |
Publisher |
: |
Total Pages |
: 388 |
Release |
: 1994 |
ISBN-10 |
: UCAL:B4286346 |
ISBN-13 |
: |
Rating |
: 4/5 (46 Downloads) |
Synopsis Proceedings of the Second International Symposium on Ultra-Clean Processing of Silicon Surfaces by : Marc Heyns
Author |
: |
Publisher |
: |
Total Pages |
: 340 |
Release |
: 2003 |
ISBN-10 |
: UOM:39015060030411 |
ISBN-13 |
: |
Rating |
: 4/5 (11 Downloads) |
Synopsis Ultra Clean Processing of Silicon Surfaces ... by :
Author |
: Marc Heyns |
Publisher |
: Scitec Publications |
Total Pages |
: 396 |
Release |
: 2005 |
ISBN-10 |
: 390845106X |
ISBN-13 |
: 9783908451068 |
Rating |
: 4/5 (6X Downloads) |
Synopsis Ultra Clean Processing of Silicon Surfaces VII by : Marc Heyns
This book is sub-divided into 10 different topical sections; each dealing with important issues in surface cleaning and preparation.
Author |
: Jerzy Rużyłło |
Publisher |
: The Electrochemical Society |
Total Pages |
: 668 |
Release |
: 1998 |
ISBN-10 |
: 1566771889 |
ISBN-13 |
: 9781566771887 |
Rating |
: 4/5 (89 Downloads) |
Synopsis Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing by : Jerzy Rużyłło
Author |
: Richard E. Novak |
Publisher |
: The Electrochemical Society |
Total Pages |
: 642 |
Release |
: 1996 |
ISBN-10 |
: 1566771153 |
ISBN-13 |
: 9781566771153 |
Rating |
: 4/5 (53 Downloads) |
Synopsis Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing by : Richard E. Novak
Author |
: Yoshio Nishi |
Publisher |
: CRC Press |
Total Pages |
: 1720 |
Release |
: 2017-12-19 |
ISBN-10 |
: 9781420017663 |
ISBN-13 |
: 1420017667 |
Rating |
: 4/5 (63 Downloads) |
Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Author |
: Takao Abe |
Publisher |
: The Electrochemical Society |
Total Pages |
: 548 |
Release |
: 1999 |
ISBN-10 |
: 1566772230 |
ISBN-13 |
: 9781566772235 |
Rating |
: 4/5 (30 Downloads) |
Synopsis Proceedings of the Third International Symposium on Defects in Silicon by : Takao Abe
Author |
: |
Publisher |
: |
Total Pages |
: 316 |
Release |
: 1998 |
ISBN-10 |
: OCLC:875215382 |
ISBN-13 |
: |
Rating |
: 4/5 (82 Downloads) |
Synopsis Ultra Clean Processing of Silicon Surfaces IV by :
The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP). The large number of papers dealing with wet cleaning processes makes it clear that this is still the dominant technology, in spite of the fact that interesting new results have been obtained by using dry cleaning processes. Another important topic at this conference was the use of ozonated DI-water as a replacement for hydrogen peroxide, or even sulfuric-based mixtures, thus offering potentially great economic and environmental savings. Altogether, the 71 contributions presented at the symposium represent a timely and authoritative assessment of the state of the art of this very interesting field.
Author |
: John Condon Bean |
Publisher |
: |
Total Pages |
: 682 |
Release |
: 1988 |
ISBN-10 |
: UOM:39015015510954 |
ISBN-13 |
: |
Rating |
: 4/5 (54 Downloads) |
Synopsis Proceedings of the Second International Symposium on Silicon Molecular Beam Epitaxy by : John Condon Bean
Author |
: P. Rai-Choudhury |
Publisher |
: The Electrochemical Society |
Total Pages |
: 496 |
Release |
: 1997 |
ISBN-10 |
: 1566771390 |
ISBN-13 |
: 9781566771399 |
Rating |
: 4/5 (90 Downloads) |
Synopsis Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices by : P. Rai-Choudhury