Annotation Contains papers from a January 1999 conference held in San Jose, California, describing concepts and metrology of Gate Dielectric Integrity (GDI) and discussing its applications for material and device processes and tool qualification. Topics include methods, protocols, and reliability assessment as related to dielectric integrity. Papers are organized in sections on concepts, thin gate dielectrics, characterization and applications, and standardization. There is also a section summarizing panel discussions. Gupta is affiliated with Mitsubishi Silicon America. Brown is affiliated with Texas Instruments Inc. Annotation copyrighted by Book News, Inc., Portland, OR.

"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.

The key science and technology challenges which will facilitate the transition from a "make do and mend" philosophy inevitably restricting the degree of intelligence which can be engineered and the "designer materials systems" philosophy which is the ultimate goal are considered. The longer term vision will need to accord much more closely with nature's design paradigms, with control at the molecular, nano, micro and macro level of synthesis and assembly, of active self repair materials systems in function shapes.

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