This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications.

This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas

Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]

The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.

This resource covering all theoretical aspects of modern geometrical charged-particle optics is aimed at anyone involved in the design of electron optical instruments and beam-guiding systems for charged particles.

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

This book contains information on scientific research and applications of a very diverse field of low temperature plasma physics – the interaction of electron beams with plasma and, as a consequence of this interaction, a beam plasma discharge. It contains detailed descriptions of the history of the relevant research, a review of experimental research of properties of the low-temperature plasma with an electron beam and beam plasma discharge, and presents the main results of beam plasma interaction theory. Most of the book is devoted to descriptions of applications of the plasma with a beam and beam plasma discharge in a variety of fields; from studies of the physics of near-Earth space using active geophysical experiments to the development of materials technologies for micro- and nanoelectronics and designs of plasma-filled electronic devices. This book will be useful as an introduction to this field for undergraduate and graduate students specializing in plasma physics, as well as for other specialists in various fields of physics and technologies.

This book presents research contributions focussing on the introduction of contemporary physics topics – mainly, but not exclusively, quantum physics – into high school currciula. Despite the important advances and discoveries in quantum physics and relativity which have revolutionized our views of nature and our everyday lives, the presence of these topics in high school physics education is still lacking. In this book physics education researchers report on the teaching and learning of quantum physics from different perspectives and discuss the design and use of different pedagogical approaches and educational pathways. There is still much debate as to what content is appropriate at high school level as well what pedagogical approaches and strategies should be adopted to support student learning. Currently there is a greater focus on how to teach modern physics at the high school level rather than classical physics. However, teachers still lack experience and availability of appropriate teaching and learning materials to support the coherent integration of Quantum Physics in high school curricula. All of the 19 papers presented in this book discuss innovative approaches for enhancing physics education in schools.

This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.