This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.

This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a to

This volume documents the proceedings of the 8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Providence, Rhode Island, June 24a 26, 2002. The study of particles on surfaces is extremely crucial in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. In a world o

This volume chronicles the proceedings of the Third Symposium on Particles on Surfaces : Detection, Adhesion and Removal held as a part of the 21st Annual Meeting of the Fine Particle Society in San Diego , California, August 21 - 25 , 1990 . The first two symposia i n t h i s series were held in 1986 and 1988 , respectively, and have been properly l documented ,2. Li ke its antecedent s the Third symposium was very well received, and the continuing success of these symposia reinforced our earlier belief that regular symposia on the topic of particles on surfaces were very much needed. Concomitantly, the fourth symposium in this series is planned in Las Vegas , July 13-17 , 199 2 . l As pointed out in the Preface to the earlier two volumes ,2, the topic of particles on surfaces is of tremendous interest and concern in a wide spectrum of technological areas . The objectives of the Third symposium were es s ent i a l ly the same as those of the earlier two and our intent her e was to provide an update on the research and development activities in the world of particles on surfaces . Apropos , there has been a deliberate attempt every time to s eek out new people to present their research results and we have been very succes s f ul in this mission.

This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book. The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. - Comprehensive coverage of innovations in surface contamination and cleaning - Written by established experts in the contamination and cleaning field - Each chapter is a comprehensive review of the state of the art - Case studies included

The surface of an object is the first thing we see or touch. Nearly every article or object we encounter at home, in industry, land transportation, aerospace, or the medical field in some way uses an adhesive, a sealant, or a decorative coating. Adhesion science provides the technology and the know-how behind these applications. Recent Advances in

This book documents the proceedings of the Third Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. This series of symposia was initiated in 1987 in light of the growing importance to eliminate particles from process gases and liquids. As pointed out in the Preface to antecedent volumes in this series that particles in process gases and liquids could cause significant yield losses in precision manufacturing and concomitantly there has been heightened interest in understanding the behavior of particles in gases and liquids and devising ways to eliminate, or at least reduce substantially, these particles. The concern about particles in gases and liquids has been there for qui.te some time in the microelectronics arena, but there are other areas also where particles are of significant concern, e.g. in operation theatres in hospitals, food and beverage industry, and pharmaceutical manufacturing. This symposium basically had the same objectives as its predecessors, but to provide an update on the R&D activity taking place in the arena of particle detection, characterization and control. The printed program comprised a total of 28 papers dealing with variegated aspects of particles in gases and liquids. There were brisk and lively discussions and the attendees offered many positive comments, which goes to show that it was a well-received and needed symposium.

This book chronicles the proceedings of the Second Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 20th Annual Fine Particle Society meeting in Boston, August 21-25, 1989. As this second symposium was as successful as the prior one, so we have decided to hold symposia on this topic on a regular (biennial) basis and the third symposium in this series is scheduled to be held at the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. l As pointed out in the Preface to the prior volume in this series that recently there has been tremendous concern about yield losses due to unwanted particles, and these unwelcome particles can originate from a legion of sources, including process gases and liquids. Also all signals indicate that in the future manufacture of sophisticated and sensitive microelectronic components (with shrinking dimensions) and other precision parts, the need for detection, characterization, analysis and control of smaller and smaller particles will be more intensified.

As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects