Silicon (Si) technologies provide an excellent platform for the design of microsystems where photonic and microelectronic functionalities are monolithically integrated on the same substrate. In recent years, a variety of passive and active Si photonic devices have been developed, and among them, photodetectors have attracted particular interest from the scientific community. Si photodiodes are typically designed to operate at visible wavelengths, but, unfortunately, their employment in the infrared (IR) range is limited due to the neglectable Si absorption over 1100 nm, even though the use of germanium (Ge) grown on Si has historically allowed operations to be extended up to 1550 nm. In recent years, significant progress has been achieved both by improving the performance of Si-based photodetectors in the visible range and by extending their operation to infrared wavelengths. Near-infrared (NIR) SiGe photodetectors have been demonstrated to have a “zero change” CMOS process flow, while the investigation of new effects and structures has shown that an all-Si approach could be a viable option to construct devices comparable with Ge technology. In addition, the capability to integrate new emerging 2D and 3D materials with Si, together with the capability of manufacturing devices at the nanometric scale, has led to the development of new device families with unexpected performance. Accordingly, this Special Issue of Micromachines seeks to showcase research papers, short communications, and review articles that show the most recent advances in the field of silicon photodetectors and their respective applications.

This book comprehensively describes an end-to-end Internet of Things (IoT) architecture that is comprised of devices, network, compute, storage, platform, applications along with management and security components. It is organized into five main parts, comprising of a total of 11 chapters. Part I presents a generic IoT reference model to establish a common vocabulary for IoT solutions. This includes a detailed description of the Internet protocol layers and the Things (sensors and actuators) as well as the key business drivers to realize the IoT vision. Part II focuses on the IoT requirements that impact networking protocols and provides a layer-by-layer walkthrough of the protocol stack with emphasis on industry progress and key gaps. Part III introduces the concept of Fog computing and describes the drivers for the technology, its constituent elements, and how it relates and differs from Cloud computing. Part IV discusses the IoT services platform, the cornerstone of the solution followed by the Security functions and requirements. Finally, Part V provides a treatment of the topic of connected ecosystems in IoT along with practical applications. It then surveys the latest IoT standards and discusses the pivotal role of open source in IoT. “Faculty will find well-crafted questions and answers at the end of each chapter, suitable for review and in classroom discussion topics. In addition, the material in the book can be used by engineers and technical leaders looking to gain a deep technical understanding of IoT, as well as by managers and business leaders looking to gain a competitive edge and understand innovation opportunities for the future.” Dr. Jim Spohrer, IBM “This text provides a very compelling study of the IoT space and achieves a very good balance between engineering/technology focus and business context. As such, it is highly-recommended for anyone interested in this rapidly-expanding field and will have broad appeal to a wide cross-section of readers, i.e., including engineering professionals, business analysts, university students, and professors.” Professor Nasir Ghani, University of South Florida

This volume presents a a selection of the papers presented at the 7th Italian Conference on Sensors and Microsystems, covering challenging topics on strategic areas as automotive, bio-sensors, fundamental chemistry for new generation of material for single molecule recognition.

This book contains extended and revised versions of the best papers presented during the fourteenth IFIP TC 10/WG 10.5 International Conference on Very Large Scale Integration. This conference provides a forum to exchange ideas and show industrial and academic research results in microelectronics design. The current trend toward increasing chip integration and technology process advancements brings about stimulating new challenges both at the physical and system-design levels.

Analytical Nanochemistry provides readers with a comprehensive review of the application of nanomaterial in analytical chemistry. It explains the fundamental concepts involved in utilizing nanomaterials including their classification, synthesis, functionalization, characterization methods, separation, and isolation techniques, as well as toxicity. It also covers fundamental information on different aspects of analytical procedures and method development. Furthermore, it emphasizes micro- and nano-enabled analytical devices and instruments as well as nanotools for nanoanalysis. The book opens with a section on fundamentals (Section 1), then continues with a section on the role of nanomaterials in analytical procedures (Section 2), including sample preparation, separation, and detection. The third section (Section 3) includes chapters on micro- and nano-enabled devices, as most miniaturized microsystems include nanofeatures. The book concludes with a fourth section (Section 4) on future perspectives, covering nanoanalysis, bioanalysis, toxic risks, and limitations of both technology and commercialization. This book serves as a valuable resource for students, instructors, and researchers in analytical chemistry, nanomaterials, and nanotechnology investigating the use of nanotechnology in their analytical procedures. - Covers the synthesis methods, functionalization process, and characterization methods of nanomaterials - Uses numerous visual elements to illustrate key points, including flowcharts, process diagrams, photographs, and visual schemes - Presents fundamental concepts and updated hot topics such as miniaturization in analytical chemistry, nanotools for nano-analysis, micro total analysis systems, and lab-on-a-chip

Presents the fundamental concepts of signal processing for all application areas of ionizing radiation This book provides a clear understanding of the principles of signal processing of radiation detectors. It puts great emphasis on the characteristics of pulses from various types of detectors and offers a full overview on the basic concepts required to understand detector signal processing systems and pulse processing techniques. Signal Processing for Radiation Detectors covers all of the important aspects of signal processing, including energy spectroscopy, timing measurements, position-sensing, pulse-shape discrimination, and radiation intensity measurement. The book encompasses a wide range of applications so that readers from different disciplines can benefit from all of the information. In addition, this resource: Describes both analog and digital techniques of signal processing Presents a complete compilation of digital pulse processing algorithms Extrapolates content from more than 700 references covering classic papers as well as those of today Demonstrates concepts with more than 340 original illustrations Signal Processing for Radiation Detectors provides researchers, engineers, and graduate students working in disciplines such as nuclear physics and engineering, environmental and biomedical engineering, and medical physics and radiological science, the knowledge to design their own systems, optimize available systems or to set up new experiments.

This significant and uniquely comprehensive five-volume reference is a valuable source for research workers, practitioners, computer scientists, students, and technologists. It covers all of the major topics within the subject and offers a comprehensive treatment of MEMS design, fabrication techniques, and manufacturing methods. It also includes current medical applications of MEMS technology and provides applications of MEMS to opto-electronic devices. It is clearly written, self-contained, and accessible, with helpful standard features including an introduction, summary, extensive figures and design examples with comprehensive reference lists.

These proceedings describe processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.