Microwave Plasma Enhanced Chemical Vapor Deposition And Structural Characterization Of Diamond Films
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Author |
: Wei Zhu |
Publisher |
: |
Total Pages |
: 530 |
Release |
: 1990 |
ISBN-10 |
: OCLC:54394593 |
ISBN-13 |
: |
Rating |
: 4/5 (93 Downloads) |
Synopsis Microwave Plasma Enhanced Chemical Vapor Deposition and Structural Characterization of Diamond Films by : Wei Zhu
Author |
: Kevin John Grannen |
Publisher |
: |
Total Pages |
: |
Release |
: 1994 |
ISBN-10 |
: OCLC:30771685 |
ISBN-13 |
: |
Rating |
: 4/5 (85 Downloads) |
Synopsis Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films by : Kevin John Grannen
Author |
: Shih-Feng Chou |
Publisher |
: |
Total Pages |
: 174 |
Release |
: 2005 |
ISBN-10 |
: OCLC:144375842 |
ISBN-13 |
: |
Rating |
: 4/5 (42 Downloads) |
Synopsis Synthesis and Characterization of Diamond Thin Films by Microwave Plasma-enhanced Chemical Vapor Deposition (MPECVD) by : Shih-Feng Chou
Diamond thin films are deposited on silicon wafers by MPECVD process with the presence of methane, argon, and hydrogen gases. The reaction chamber is designed with an internal microwave reaction cavity and a high-pressure pocket for improving deposition conditions. Scanning electron microscopy reveals tetrahedral and cauliflower-shaped crystals for polycrystalline diamond and nanocrystalline diamond films, respectively. Spectroscopy ellipsometer studies indicate that diamond-like carbon (DLC) films are deposited with a thickness of 700 nm. Fourier transform infrared spectroscopy shows C-H stretching in the range from 2800 cm -1 to 3000 cm -1 . Nanoindentation is performed on DLC films with an average hardness of 10.98 GPa and an average elastic modulus of 90.32 GPa. The effects of chamber pressure, microwave forward power, and gas mixture on the plasma chemistry are discussed. Substrate temperature has a significant influence on film growth rate, and substrate pretreatment can enhance the quality of diamond films.
Author |
: Gerald Lucovsky |
Publisher |
: Mrs Proceedings |
Total Pages |
: 280 |
Release |
: 1990-09-05 |
ISBN-10 |
: UOM:39015018851504 |
ISBN-13 |
: |
Rating |
: 4/5 (04 Downloads) |
Synopsis Characterization of Plasma-Enhanced CVD Processes: Volume 165 by : Gerald Lucovsky
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author |
: Koji Kobashi |
Publisher |
: Elsevier |
Total Pages |
: 350 |
Release |
: 2010-07-07 |
ISBN-10 |
: 9780080525570 |
ISBN-13 |
: 0080525571 |
Rating |
: 4/5 (70 Downloads) |
Synopsis Diamond Films by : Koji Kobashi
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Author |
: Ashish Shrotriya |
Publisher |
: |
Total Pages |
: 166 |
Release |
: 1993 |
ISBN-10 |
: OCLC:28348812 |
ISBN-13 |
: |
Rating |
: 4/5 (12 Downloads) |
Synopsis Electrical and Structural Characterization of Diamond Thin Films Grown by Chemical Vapor Deposition by : Ashish Shrotriya
Author |
: Wen-Shin Huang |
Publisher |
: |
Total Pages |
: 798 |
Release |
: 2004 |
ISBN-10 |
: MSU:31293025044862 |
ISBN-13 |
: |
Rating |
: 4/5 (62 Downloads) |
Synopsis Microwave Plasma Assisted Chemical Vapor Deposition of Ultra-nanocrystalline Diamond Films by : Wen-Shin Huang
Author |
: |
Publisher |
: |
Total Pages |
: 61 |
Release |
: 1990 |
ISBN-10 |
: OCLC:227754463 |
ISBN-13 |
: |
Rating |
: 4/5 (63 Downloads) |
Synopsis Growth, Characterization and Device Development in Monocrystalline Diamond Films by :
Two chemical vapor deposition (CVD) systems (hot filament and microwave plasma) and a multitechnique analysis system have been designed, constructed and characterized. The effects of surface steps, substrate material and substrate/filament bias have been examined. Diamond films from outside sources have been analyzed by a variety of techniques. Most notably, numerous defects, especially (111) twins, have been identified by TEM and are similar to those found in natural diamond. Certain diamond particles were in a twinned epitaxial relationship with the Silicon substrate. It has also been found that a thin Silicon carbide layer forms immediately (i.e.
Author |
: Jes Asmussen |
Publisher |
: CRC Press |
Total Pages |
: 692 |
Release |
: 2002-01-23 |
ISBN-10 |
: 0203910605 |
ISBN-13 |
: 9780203910603 |
Rating |
: 4/5 (05 Downloads) |
Synopsis Diamond Films Handbook by : Jes Asmussen
The Diamond Films Handbook is an important source of information for readers involved in the new diamond film technology, emphasizing synthesis technologies and diamond film applications. Containing over 1600 references, drawings, photographs, micrographs, equations, and tables, and contributions by experts from both industry and academia, it inclu
Author |
: |
Publisher |
: |
Total Pages |
: 702 |
Release |
: 1995 |
ISBN-10 |
: UIUC:30112048646605 |
ISBN-13 |
: |
Rating |
: 4/5 (05 Downloads) |
Synopsis Scientific and Technical Aerospace Reports by :