Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.

Ion Beam Handbook for Material Analysis emerged from the U.S.-Italy Seminar on Ion Beam Analysis of Near Surface Regions held at the Baia-Verde Hotel, Catania, June 17-20, 1974. The seminar was sponsored by the National Science Foundation and the Consiglio Nazionale delle Ricerche under the United States-Italy Cooperative Science Program. The book provides a useful collection of tables, graphs, and formulas for those involved in ion beam analysis. These tables, graphs, and formulas are divided into five chapters that cover the following topics: energy loss and energy straggling; backscattering spectrometry; channeling; applications of ion-induced nuclear reactions; and the use of ion-induced X-ray yields.

Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. Examines classical collision theory Details the fundamentals of five specific ion beam analysis techniques Illustrates specific applications, including biomedicine and thin film analysis Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.

The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Comprehensive guide to an important materials science technique for students and researchers.

The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.

Backscattering Spectrometry reviews developments in backscattering spectrometry and covers topics ranging from instrumentation and experimental techniques to beam parameters and energy loss measurements. Backscattering spectrometry of thin films is also considered, and examples of backscattering analysis are given. This book is comprised of 10 chapters and begins with an introduction to backscattering spectrometry, what it can and what it cannot accomplish, and some ""rules of thumb"" for interpreting or reading spectra. The relative strengths and weaknesses of backscattering spectrometry in the framework of materials analysis are outlined. The following chapters focus on kinematics, scattering cross sections, energy loss, and energy straggling; backscattering analysis of thin films of various degrees of complications; the influence of beam parameters; and mass and depth resolutions and their relationships to the mass and energy of projectiles. Many examples of backscattering analysis are also presented to illustrate the capability and limitation of backscattering. Backscattering applications when combined with channeling effects are considered as well. The final chapter provides a list of references on the applications of backscattering spectrometry. This monograph will be a useful resource for physicists.

Presents views on current developments in heat and mass transfer research related to the modern development of heat exchangers. Devotes special attention to the different modes of heat and mass transfer mechanisms in relation to the new development of heat exchangers design. Dedicates particular attention to the future needs and demands for further development in heat and mass transfer. GaN and related materials are attracting tremendous interest for their applications to high-density optical data storage, blue/green diode lasers and LEDs, high-temperature electronics for high-power microwave applications, electronics for aerospace and automobiles, and stable passivation films for semiconductors. In addition, there is great scientific interest in the nitrides, because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. This series provides a forum for the latest research in this rapidly-changing field, offering readers a basic understanding of new developments in recent research. Series volumes feature a balance between original theoretical and experimental research in basic physics, device physics, novel materials and quantum structures, processing, and systems.

Materials science is the prime example of an interdisciplinary science. It - compasses the ?elds of physics, chemistry, material science, electrical en- neering, chemical engineering and other disciplines. Success has been o- standing. World-class accomplishments in materials have been recognized by NobelprizesinPhysicsandChemistryandgivenrisetoentirelynewtechno- gies. Materials science advances have underpinned the technology revolution that has driven societal changes for the last ?fty years. Obviouslytheendisnotinsight!Futuretechnology-basedproblemsd- inatethecurrentscene.Highonthelistarecontrolandconservationofenergy and environment, water purity and availability, and propagating the inf- mation revolution. All fall in the technology domain. In every case proposed solutions begin with new forms of materials, materials processing or new arti?cial material structures. Scientists seek new forms of photovoltaics with greater e?ciency and lower cost. Water purity may be solved through surface control, which promises new desalination processes at lower energy and lower cost. Revolutionary concepts to extend the information revolution reside in controlling the “spin” of electrons or enabling quantum states as in quantum computing. Ion-beam experts make substantial contributions to all of these burgeoning sciences.