The development of surface physics and surface chemistry as a science is closely related to the technical development of a number of methods involving electrons either as an excitation source or as an emitted particle carrying characteristic information. Many of these various kinds of electron spectroscopies have become commercially available and have made their way into industrial laboratories. Others are still in an early stage, but may become of increasing importance in the future. In this book an assessment of the various merits and possible drawbacks of the most frequently used electron spectroscopies is attempted. Emphasis is put on prac tical examples and experimental design rather than on theoretical considerations. The book addresses itself to the reader who wishes to know which electron spectroscopy or which combination of different electron spectroscopies he may choose for the particular problems under investigation. After a brief introduction the practical design of electron spectrometers and their figures of merit important for the different applications are discussed in Chapter 2. Chapter 3 deals with electron excited electron spectroscopies which are used for the elemental analysis of surfaces. Structure analysis by electron diffrac tion is described in Chapter 4 with special emphasis on the use of electron diffrac tion for the investigation of surface imperfections. For the application of electron diffraction to surface crystallography in general, the reader is referred to Volume 4 of "Topics in Applied Physics".

Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.

This book covers state-of-the-art techniques commonly used in modern materials characterization. Two important aspects of characterization, materials structures and chemical analysis, are included. Widely used techniques, such as metallography (light microscopy), X-ray diffraction, transmission and scanning electron microscopy, are described. In addition, the book introduces advanced techniques, including scanning probe microscopy. The second half of the book accordingly presents techniques such as X-ray energy dispersive spectroscopy (commonly equipped in the scanning electron microscope), fluorescence X-ray spectroscopy, and popular surface analysis techniques (XPS and SIMS). Finally, vibrational spectroscopy (FTIR and Raman) and thermal analysis are also covered.

Surface analysis--the examination of the outer few nanometers of a material--is a routine undertaking in laboratories throughout the world, and is of great importance in such areas as corrosion, adhesion, polymer surface treatment, and microelectronics fabrication. This handbook provides an introduction to the two most popular surface analysis techniques: X-ray photoelectron spectroscopy and Auger electron spectroscopy. It explains the underlying physical principles, discusses instrumentation, and looks at the interpretation of resulting spectra. Applications of the two techniques are considered, and a critical comparison with other available methods is also included. This fully illustrated guide will be a valuable introduction for students and researchers in physics, engineering, and materials science.

A self-contained book on electron microscopy and spectrometry techniques for surface studies.

This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Photoelectron spectroscopy is now becoming more and more required to investigate electronic structures of various solid materials in the bulk, on surfaces as well as at buried interfaces. The energy resolution was much improved in the last decade down to 1 meV in the low photon energy region. Now this technique is available from a few eV up to 10 keV by use of lasers, electron cyclotron resonance lamps in addition to synchrotron radiation and X-ray tubes. High resolution angle resolved photoelectron spectroscopy (ARPES) is now widely applied to band mapping of materials. It attracts a wide attention from both fundamental science and material engineering. Studies of the dynamics of excited states are feasible by time of flight spectroscopy with fully utilizing the pulse structures of synchrotron radiation as well as lasers including the free electron lasers (FEL). Spin resolved studies also made dramatic progress by using higher efficiency spin detectors and two dimensional spin detectors. Polarization dependent measurements in the whole photon energy spectrum of the spectra provide useful information on the symmetry of orbitals. The book deals with the fundamental concepts and approaches for the application of this technique to materials studies. Complementary techniques such as inverse photoemission, photoelectron diffraction, photon spectroscopy including infrared and X-ray and scanning tunneling spectroscopy are presented. This book provides not only a wide scope of photoelectron spectroscopy of solids but also extends our understanding of electronic structures beyond photoelectron spectroscopy.