Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.

An Institute like ours cannot help but lend credence to the notion of the late Derek J. de Solla Price of Yale University that "the scientific revolution was largely the improvement, invention and use of a series of instruments . . . . that expanded the reach of science in innumerable directions". Most of science today and in years gone by depends on the experimental observation of struc ture on the small scale with microscopes, and on the large scale with telescopes. The first instruments to expand the observational range of the human eye were simple optical systems, designed in the case of microscopes and telescopes to magnify the image. The big breakthrough in the 17th century was not when Galileo first turned his telescope to the heavens, but when improvements in lens-grinding techniques allowed eyeglass makers to make the first telescope. Early microscopy revealed new and previously unsuspected microstruc tures in biological and non-biological materials and thus helped to enlarge on the understanding of the relationship between structure and properties. The natural inclination of all microscopists, the desire to observe ever smaller structures, was satisfied by the construction of higher quality optical systems which reduced the aberrations limiting the usable magnification. The modem optical microscope is the result of this evolution in design and construction, and it can be operated easily to achieve close to the theoretical resolution.

The post-industrial societies' demand for more information processing and communication is a challenge to modern technology.This workshop is the first forum in Italy fully devoted to the advanced materials for opto-electronic and photonic device applications.The volume contains selected papers presented at the workshop and provide an updated overview by leading Italian public and private research groups on the state-of-the-art developments in crystal growth, tailoring and characterization of a large class of materials, namely semiconductors, glasses, polymers and organic molecules.Internationally recognized scientists on materials science have contributed to the workshop and their contributions have been reported in this volume.

Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.

The most recent advances in the use of polymeric materials by the electronic industry can be found in Polymers for Electronic and Photonic Applications. This bookprovides in-depth coverage of photoresis for micro-lithography, microelectronic encapsulants and packaging, insulators, dielectrics for multichip packaging,electronic and photonic applications of polymeric materials, among many other topics. Intended for engineers and scientists who design, process, and manufacturemicroelectronic components, this book will also prove useful for hybrid and systems packaging managers who want to be informed of the very latest developments inthis field.* Presents most recent advances in the use of polymeric materials by the electronic industry* Contributions by foremost experts in the field

Industrial Applications of Lasers focuses on how lasers have been used for practical applications in industry. This text aims to stimulate the imagination of the readers, who can then evaluate the potential application of lasers to solve their own problems. Comprised of 21 chapters, this book starts with an overview of the fundamental background of lasers, and then discusses the basic principles of how lasers operate. Other chapters provide an understanding of how holograms really work. This text also discusses several topics relevant to lasers, themselves, including the types of practical lasers and laser properties. This book considers laser safety, which is very important for anyone considering a laser application. Finally, this text explores the various developed laser applications, including scribing of ceramics, laser welding and cutting of metals, as well as applications in surveying, alignment, and metrology. This book is a valuable resource to laser technicians, physicists, scientists, researchers, and readers whose interests span a variety of fields.

Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.

The object of this book is to review and to discuss some important applications of polymers in electronics. The first three chapters discuss the current primary applications of polymers in semiconductor device manufacturing: polymers as resist materials for integrated circuit fabrication, polyimides as electronics packaging materials, and polymers as integrated circuits encapsulates.