Characterization And Metrology For Ulsi Technology 2003
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Author |
: David G. Seiler |
Publisher |
: American Institute of Physics |
Total Pages |
: 868 |
Release |
: 2003-10-08 |
ISBN-10 |
: UOM:39015052982736 |
ISBN-13 |
: |
Rating |
: 4/5 (36 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology: 2003 by : David G. Seiler
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Topics include: integrated circuit history, challenges and overviews, front end, lithography, interconnect and back end, and critical analytical techniques. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The editors believe that this book of collected papers provides a concise and effective portrayal of industry characterization needs and the way they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. Hopefully, it will also provide a basis for stimulating advances in metrology and new ideas for research and development.
Author |
: |
Publisher |
: |
Total Pages |
: |
Release |
: 2005 |
ISBN-10 |
: OCLC:1131974383 |
ISBN-13 |
: |
Rating |
: 4/5 (83 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology by :
Author |
: David G. Seiler |
Publisher |
: American Institute of Physics |
Total Pages |
: 708 |
Release |
: 2001-03-01 |
ISBN-10 |
: 156396967X |
ISBN-13 |
: 9781563969676 |
Rating |
: 4/5 (7X Downloads) |
Synopsis Characterization and Metrology for ULSI Technology 2000 by : David G. Seiler
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of the process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. It provides a concise and effective portrayal of industry characterization needs and some of the problems that must be addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. It also provides a basis for stimulating practical perspectives and new ideas for research and development.
Author |
: |
Publisher |
: |
Total Pages |
: |
Release |
: 2000 |
ISBN-10 |
: OCLC:1132105607 |
ISBN-13 |
: |
Rating |
: 4/5 (07 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology 2000 by :
Author |
: David G. Seiler |
Publisher |
: American Institute of Physics |
Total Pages |
: 714 |
Release |
: 2005-09-29 |
ISBN-10 |
: UOM:39015069190943 |
ISBN-13 |
: |
Rating |
: 4/5 (43 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology 2005 by : David G. Seiler
The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The book also covers emerging nano-devices and the corresponding metrology challenges that arise.
Author |
: |
Publisher |
: |
Total Pages |
: 960 |
Release |
: 1998 |
ISBN-10 |
: OCLC:637776161 |
ISBN-13 |
: |
Rating |
: 4/5 (61 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology by :
Author |
: ASM International |
Publisher |
: ASM International |
Total Pages |
: 534 |
Release |
: 2003-01-01 |
ISBN-10 |
: 9781615030866 |
ISBN-13 |
: 1615030867 |
Rating |
: 4/5 (66 Downloads) |
Synopsis Istfa 2003 by : ASM International
Author |
: D.G. Seiler |
Publisher |
: American Institute of Physics |
Total Pages |
: 960 |
Release |
: 1998-11-01 |
ISBN-10 |
: 1563968673 |
ISBN-13 |
: 9781563968679 |
Rating |
: 4/5 (73 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology: 1998 International Conference, 23-27 March 1998 by : D.G. Seiler
The proceedings of the 1998 International Conference on Characterization and Metrology for ULSI Technology was dedicated to summarizing major issues and giving critical reviews of important semiconductor techniques that are crucial to continue the advances in semiconductor technology. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This is the only book that we know of that emphasizes the science and technology of semiconductor characterization in the factory environment. The increasing importance of monitoring and controlling semiconductor processes make it particularly timely.
Author |
: David G. Seiler |
Publisher |
: |
Total Pages |
: 734 |
Release |
: 2001 |
ISBN-10 |
: UOM:39015042561129 |
ISBN-13 |
: |
Rating |
: 4/5 (29 Downloads) |
Synopsis Characterization and Metrology for ULSI Technology, 2000 by : David G. Seiler
Author |
: S McVitie |
Publisher |
: CRC Press |
Total Pages |
: 520 |
Release |
: 2004-02-19 |
ISBN-10 |
: 0750309679 |
ISBN-13 |
: 9780750309677 |
Rating |
: 4/5 (79 Downloads) |
Synopsis Electron Microscopy and Analysis 2003 by : S McVitie
Electron microscopy is now a mainstay characterization tool for solid state physicists and chemists as well as materials scientists. Containing the proceedings from the Electron Microscopy and Analysis Group (EMAG) conference in September 2003, this volume covers current developments in the field, primarily in the UK. These conferences are biennial events organized by the EMAG of the Institute of Physics to provide a forum for discussion of the latest developments in instrumentation, techniques, and applications of electron and scanning probe microscopies.